The effect of growth temperature on atomic ordering in Ga0.52In0.48P epilayers grown on GaAs(001) substrates by GS-MBE

被引:0
作者
Meenakarn, C
StatonBevan, AE
Dawson, MD
Duggan, G
Kean, AH
Najda, SP
机构
来源
THIN FILMS - STRUCTURE AND MORPHOLOGY | 1997年 / 441卷
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中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A Transmission Electron Microscopy (TEM), Photoluminescence (PL) and Photoluminescence Excitation Spectroscopy (PLE) investigation has been conducted on Ga0.52In0.48P epilayers, grown on GaAs(001) by Gas-Source Molecular Beam Epitaxy. Selected area diffraction in the TEM shows that epilayers grown at temperatures between 480 degrees C and 535 degrees C exhibit CuPt-type ordering with the antiphase domain size increasing with increasing growth temperature. PLE data shows that, in the temperature range 480 degrees C to 535 degrees C the band gap energy of Ga0.52In0.48P epilayers increases with increasing growth temperature fi om 1.971 to 2.003 (+/-0.001 eV). For high band gap optical data storage applications these values compare well with the highest band gap energies reported for epilayers grown by MOCVD.
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页码:21 / 26
页数:6
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