DEPOSITION OF COPPER, SILVER, AND NICKEL ON ALUMINUM BY GALVANIC REPLACEMENT

被引:7
|
作者
Kuntyi, O. I. [1 ]
Zozulya, H. I. [1 ]
Dobrovets'ka, O. Ya. [1 ]
Kornii, S. A. [2 ]
Reshetnyak, O. V. [3 ]
机构
[1] Lvivska Politekhn Natl Univ, Lvov, Ukraine
[2] Ukrainian Natl Acad Sci, Karpenko Physicomech Inst, Lvov, Ukraine
[3] Franko Lviv Natl Univ, Lvov, Ukraine
关键词
aluminum; galvanic replacement; metal complexes; copper; silver; nickel; ELECTROLESS DEPOSITION; DISPLACEMENT; ELECTRODEPOSITION; DENDRITES; THIOUREA; SERS; FOIL; AL; AG;
D O I
10.1007/s11003-018-0099-x
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present the results of investigation of the galvanic replacement of copper, silver, and nickel on the surface of aluminum in solutions of complexes: copper from pyrophosphate solution [Cu(P2O7)(2)](6-) ; nickel from ammoniate solution [Ni(NH3)(6)](2+) , and silver from ammoniate [Ag(NH3)(2)](+) and thiocarbamide [Ag(SC(NH2)(2))(2)](+) solutions. It is shown that the concentration of complex ions, their stability, and the time of galvanic replacement are the main factors affecting the morphology of deposits and the geometry of metal particles. It is shown that, as the concentration of complexes in solutions decreases, their stability increases, and the duration of the process decreases, the size of particles of the reduced metal decreases from approximate to 1 mu m down to similar to 300-70 nm.
引用
收藏
页码:488 / 494
页数:7
相关论文
共 50 条
  • [1] Deposition of Copper, Silver, and Nickel on Aluminum by Galvanic Replacement
    О. І. Kuntyi
    H. І. Zozulya
    О. Ya. Dobrovets’ka
    S. А. Kornii
    О. V. Reshetnyak
    Materials Science, 2018, 53 : 488 - 494
  • [2] Galvanic replacement deposited copper layer as an efficient activator to realize electroless Ni-P plating on aluminum
    Zhao, Qiuping
    Liao, Wanda
    Li, Rupeng
    Hu, Guanqun
    Bai, Changning
    Zhang, Xingkai
    JOURNAL OF SOLID STATE ELECTROCHEMISTRY, 2024, 28 (09) : 3175 - 3186
  • [3] Adhesion of electrodeposited copper, nickel and silver films on copper, nickel and silver substrates
    Okamoto, N
    Wang, F
    Watanabe, T
    MATERIALS TRANSACTIONS, 2004, 45 (12) : 3330 - 3333
  • [4] The adhesion of electrodeposited copper, nickel and silver films on copper, nickel and silver substrates
    Okamoto, N
    Watanabe, T
    JOURNAL OF THE JAPAN INSTITUTE OF METALS, 2004, 68 (02) : 110 - 113
  • [5] The optimisation of facile substrates for surface enhanced Raman scattering through galvanic replacement of silver onto copper
    Mabbott, Samuel
    Larmour, Iain A.
    Vishnyakov, Vladimir
    Xu, Yun
    Graham, Duncan
    Goodacre, Royston
    ANALYST, 2012, 137 (12) : 2791 - 2798
  • [6] Influence of ultrasound on the deposition of Ag, Au, and Pd on the silicon surface by galvanic replacement in organic aprotic solutions
    Shepida, Mariana
    Zozulya, Galyna
    Kuntyi, Orest
    Holovchuk, Myron
    Sozanskyi, Martyn
    Sukhatskiy, Yuriy
    MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 2023, 752 (01) : 142 - 148
  • [7] Deposition of copper, silver and gold from aqueous solutions onto germanium substrates via galvanic displacement
    Djokic, S. S.
    Djokic, N. S.
    Guthy, C.
    Thundat, T.
    ELECTROCHIMICA ACTA, 2013, 109 : 475 - 481
  • [8] Silver - Copper Bimetallic Flexible Electrodes Prepared Using a Galvanic Replacement Reaction and Their Applications
    Thota, Raju
    Sundari, S.
    Berchmans, Sheela
    Ganesh, V.
    CHEMISTRYSELECT, 2017, 2 (06): : 2114 - 2122
  • [9] Cyanide-Free Silver Electrochemical Deposition on Copper and Nickel
    Christophe, J.
    Guilbert, G.
    Rayee, Q.
    Poelman, M.
    Olivier, M-G
    Buess-Herman, C.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2018, 165 (14) : D676 - D680
  • [10] Analytical expressions for spectral dependences of silver, gold, copper and aluminum dielectric permittivity
    Fitio, Volodymyr
    Yaremchuk, Iryna
    Vernyhor, Oleksandr
    Bobitski, Yaroslav
    OPTICA APPLICATA, 2020, 50 (02) : 171 - 184