Field electron emission from individual diamond cone formed by plasma etching

被引：36

作者：

Wang, Q.

Wang, Z. L.

Li, J. J.

Huang, Y.

Li, Y. L.

Gu, C. Z. ^{[1
]}

Cui, Z.

机构：

[1] Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Beijing 100080, Peoples R China

[2] Rutherford Appleton Lab, Didcot OX11 0QX, Oxon, England

来源：

APPLIED PHYSICS LETTERS | 2006年 / 89卷 / 06期

基金：

中国国家自然科学基金;

关键词：

D O I：

10.1063/1.2266991

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Field electron emission properties of individual diamond cone were investigated using a customized double-probe scanning electron microscope system. The diamond cone was formed by maskless ion sputtering process in bias-assisted hot filament chemical vapor deposition system. The as-formed sharp diamond cone coated with high-sp(2)-content amorphous carbon exhibited high emission current of about 80 mu A at an applied voltage of 100 V. The field emission was stable and well in consistent with the conventional Fowler-Nordheim emission mechanism, due to a stabilization process in surface work function. It has demonstrated the possibility of using individual diamond cone as a point electron emission source, because of its high field electron emission ability and stable surface state after the process of work function stabilization. (c) 2006 American Institute of Physics.

引用

页数：3

共 20 条

[1] Evolution of sp2 bonding with deposition temperature in tetrahedral amorphous carbon studied by Raman spectroscopy [J].