Self-Consistent Field Theory of Directed Self-Assembly on CH Pitch Division

被引：1
|
作者：
Tominaga, Tetsuo [1 ]
Minegishi, Shinya [1 ]
Komatsu, Hiroyuki [1 ]
Naruoka, Takehiko [1 ]
Nagai, Tomoki [1 ]
Izumi, Kenichi [1 ,2 ]
Fredrickson, Glenn H. [2 ]
机构：
[1] JSR Corp, Yokaichi, Mie 5108552, Japan
[2] Univ Calif Santa Barbara, Santa Barbara, CA 93106 USA
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2014年 / 27卷 / 01期
关键词：
Direct self-assembly; graphoepitaxy; contact holes; pitch division; self-consistent field theory; EUV RESIST; SIMULATIONS; CHALLENGES;
D O I：
10.2494/photopolymer.27.49
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
We have done SCFT simulations to investigate the directed self-assembly on CH pitch division. The structural change by the thickness Lz of oval prepattern reveals that perpendicular cylinders are favored when Lz is not commensurate with the distance between cylinders L0. In this case linear rows of cylinders are along major radius for narrow ovals, and wider ovals tend to pack additional rows of cylinders in a staggered hexagonal arrangement. Sweeping from neutral to PMMA attractive substrates causes a transition from cylinders that penetrate completely through the film, to cylinders that terminate in nearly spherical caps. Thus a neutral substrate would be favorable in order to get cylinders that penetrate completely through the film. © 2014SPST.
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收藏
页码：49 / 52
页数：4
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