Substrate bias induced synthesis of flowered-like bunched carbon nanotube directly on bulk nickel

被引：7

作者：

Bisht, Atul ^{[1
,4
]}

Chockalingam, S. ^{[1
]}

Panwar, O. S. ^{[1
,4
]}

Kesarwani, A. K. ^{[1
,4
]}

Singh, B. P. ^{[2
,4
]}

Singh, V. N. ^{[3
,4
]}

机构：

[1] Dr KS Krishnan Marg, CSIR Natl Phys Lab, Phys Energy Harvesting Div, Polymorph Carbon Thin Films Grp, New Delhi 110012, India

[2] Dr KS Krishnan Marg, CSIR Natl Phys Lab, Div Mat Phys & Engn, Phys & Engn Carbon Mat, New Delhi 110012, India

[3] Dr KS Krishnan Marg, CSIR Natl Phys Lab, Sophisticated & Analyt Instruments, Electon & Ion Microscopy, New Delhi 110012, India

[4] Acad Sci & Innovat Res AcSIR, New Delhi 110012, India

来源：

MATERIALS RESEARCH BULLETIN | 2016年 / 74卷

关键词：

Nanostructures; Plasma deposition; Electron microscopy; Raman spectroscopy; Electrical properties; FIELD-EMISSION PROPERTIES; GROWTH; GRAPHENE; FILMS; MECHANISM;

D O I：

10.1016/j.materresbull.2015.10.011

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This paper reports the effect of substrate bias on the multiwalled carbon nanotube (MWCNT) deposited on nickel foil by microwave plasma enhanced chemical vapor deposition technique. The MWCNTs have been characterized by the scanning electron microscopy (SEM), high resolution transmission electron microscopy (HRTEM), Raman spectroscopy, field emission and current-voltage characteristic of the heterojunction diode. The SEM images exhibit unique hierarchical flowered-like bunched and conformally coated MWCNTs. Substrate bias induced ion bombardment helps in the enhancement of hydrocarbon dissociation and is responsible for flowered-like MWCNTs growth. The HRTEM micrographs show the base growth mechanism for MWCNTs. The value of turn on field for emission decreases from 5.5 to 1.9 V/mu m and field enhancement factor increases from 927 to 4770, respectively, with the increase of substrate bias. The diode ideality factor of CNT/n-Si heterojunction is evaluated as 2.4 and the on/off current ratio is found to be 7 at +/- 2V, respectively. (C) 2015 Elsevier Ltd. All rights reserved.

引用

页码：156 / 163

页数：8

共 43 条

[1] Nickel Catalyst-Assisted Vertical Growth of Dense Carbon Nanotube Forests on Bulk Copper [J].

Atthipalli, Gowtam ;

Epur, Rigved ;

Kumta, Prashant N. ;

Yang, Mengjin ;

Lee, Jung-Kun ;

Gray, Jennifer L. .

JOURNAL OF PHYSICAL CHEMISTRY C, 2011, 115 (09) :3534-3538

[2] Structural, Field Emission and Ammonia Gas Sensing Properties of Multiwalled Carbon Nanotube-Graphene Like Hybrid Films Deposited by Microwave Plasma Enhanced Chemical Vapor Deposition Technique [J].

Bisht, Atul ;

Chockalingam, S. ;

Panwar, O. S. ;

Kesarwani, A. K. ;

Ishpal ;

Singh, B. P. ;

Singh, V. N. .

SCIENCE OF ADVANCED MATERIALS, 2015, 7 (07) :1424-1434

[3] Synthesis of Nanostructure Carbon Films Deposited by Microwave Plasma-Enhanced Chemical Vapor Deposition Technique at Room Temperature [J].

Bisht, Atul ;

Chockalingam, Sreekumar ;

Panwar, O. S. ;

Srivastava, A. K. ;

Kesarwani, Ajay Kumar .

FULLERENES NANOTUBES AND CARBON NANOSTRUCTURES, 2015, 23 (05) :455-462

[4] EXTRACTION OF SCHOTTKY DIODE PARAMETERS FROM FORWARD CURRENT-VOLTAGE CHARACTERISTICS [J].

CHEUNG, SK ;

CHEUNG, NW .

APPLIED PHYSICS LETTERS, 1986, 49 (02) :85-87

[5] Synthesis, structural and field emission properties of multiwall carbon nanotube-graphene-like nanocarbon hybrid films grown by microwave plasma enhanced chemical vapor deposition [J].

Chockalingam, Sreekumar ;

Bisht, Atul ;

Panwar, O. S. ;

Kesarwani, A. K. ;

Singh, B. P. ;

Chand, Jagdish ;

Singh, V. N. .

MATERIALS CHEMISTRY AND PHYSICS, 2015, 156 :38-46

[6] Carbon Nanotubes: Present and Future Commercial Applications [J].

De Volder, Michael F. L. ;

Tawfick, Sameh H. ;

Baughman, Ray H. ;

Hart, A. John .

SCIENCE, 2013, 339 (6119) :535-539

[7] Effects of ions and atomic hydrogen in plasma-assisted growth of single-walled carbon nanotubes [J].

Denysenko, I. ;

Ostrikov, K. ;

Yu, M. Y. ;

Azarenkov, N. A. .

JOURNAL OF APPLIED PHYSICS, 2007, 102 (07)

[8] CVD growth of carbon nanotubes directly on nickel substrate [J].

Du, CS ;

Pan, N .

MATERIALS LETTERS, 2005, 59 (13) :1678-1682

[9] Electron emission in intense electric fields [J].

Fowler, RH ;

Nordheim, L .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-CONTAINING PAPERS OF A MATHEMATICAL AND PHYSICAL CHARACTER, 1928, 119 (781) :173-181

[10] RF-PECVD growth and nitrogen plasma functionalization of CNTs on copper foil for electrochemical applications [J].

Hussain, Shahzad ;

Amade, Roger ;

Moreno, Harold ;

Bertran, Enric .

← 1 2 3 4 5 →