Optimization of characteristics related to the emitter-base junction in self-aligned SEG SiGeHBTs and their application in 72-GHz-static/92-GHz-dynamic frequency dividers

被引:10
作者
Washio, K [1 ]
Ohue, E
Oda, K
Hayami, R
Tanabe, M
Shimamoto, H
机构
[1] Hitachi Ltd, Cent Res Lab, Tokyo 1858601, Japan
[2] Hitachi Device Engn Co Ltd, Tokyo 1858601, Japan
关键词
bipolar transistors; emitter coupled logic; epitaxial growth; frequency conversion; heterojunctions; millimeter wave bipolar integrated circuits; millimeter wave monolithic integrated circuits (MIMICs); optical communication;
D O I
10.1109/TED.2002.803661
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Characteristics related to the emitter-base junction of self-afigned selective-epitaxial-growth SiGe heterojunction bipolar transistors (HBTs) were optimized for use with a highly-doped base. The thickness of the Si-cap layer affected both the emitter-base junction concentration and space-charge width, so the dc and ac characteristics of the SiGe HBTs were in turn dependent on this thickness. With a 4 X 10(19)-cm(-3) boron-doped base, a 131-GHz cutoff frequency and ECL gate-delay time of 5.4H ps were achieved for the optimized SiGe HBTs. A static frequency divider with a maximum operating frequency of 72.2 GHz and a dynamic frequency divider with a maximum operating frequency of 92.4 GHz were developed for the optical-fiber link and millimeter-wave communication systems of the future.
引用
收藏
页码:1755 / 1760
页数:6
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