A fractal model for the first stages of thin film growth

被引:11
作者
Jensen, P
Barabasi, AL
Larralde, H
Havlin, S
Stanley, HE
机构
[1] UNIV NOTRE DAME,DEPT PHYS,NOTRE DAME,IN 46556
[2] UNIV CAMBRIDGE,CAVENDISH LAB,DEPT PHYS,CAMBRIDGE CB3 0HE,ENGLAND
[3] BAR ILAN UNIV,DEPT PHYS,RAMAT GAN,ISRAEL
[4] BOSTON UNIV,DEPT PHYS,BOSTON,MA 02215
[5] BOSTON UNIV,CTR POLYMER STUDIES,BOSTON,MA 02215
来源
FRACTALS-AN INTERDISCIPLINARY JOURNAL ON THE COMPLEX GEOMETRY OF NATURE | 1996年 / 4卷 / 03期
关键词
D O I
10.1142/S0218348X96000431
中图分类号
O1 [数学];
学科分类号
0701 ; 070101 ;
摘要
In this paper, we briefly review a model that describes the diffusion-controlled aggregation exhibited by particles as they are deposited on a surface. This model allows us to understand many experiments of thin film deposition. In the Sec. 1, we describe the model, which incorporates deposition, particle and cluster diffusion, and aggregation. In Sec. 2, we study the dynamical evolution of the model. Finally, we analyze the effects of small cluster mobility and show that the introduction of cluster diffusion dramatically affects the dynamics of film growth. Some of these effects can be tested experimentally.
引用
收藏
页码:321 / 329
页数:9
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