Spin- and angle-resolved photoemission on topological materials

被引：29

作者：

Dil, J. Hugo ^{[1
,2
]}

机构：

[1] Ecole Polytech Fed Lausanne, Inst Phys, CH-1015 Lausanne, Switzerland

[2] Paul Scherrer Inst, Photon Sci Dept, CH-5232 Villigen, Switzerland

来源：

ELECTRONIC STRUCTURE | 2019年 / 1卷 / 02期

基金：

瑞士国家科学基金会;

关键词：

topological materials; spin-resolved ARPES; spin interference; topological insulators; Weyl semimetals; SINGLE DIRAC CONE; NORMAL EMISSION; INSULATOR; SURFACE; PT(110); POLARIZATION; MANIPULATION; REALIZATION; TRANSITION; TEXTURE;

D O I：

10.1088/2516-1075/ab168b

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A review of spin- and angle-resolved photoemission on topological materials is presented, with a specific focus on results obtained by the author. This work is aimed at readers who are new to the field or those who wish to obtain an overview of the activities in the field with respect to spin-resolved measurements. The main focus lies on topological insulators, but also Weyl and other semimetals are discussed. Further it will be explained why the measured spin polarisation from a spin polarised state should always add up to 100% and how spin interference effects influence the measured spin texture.

引用

页数：19

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