Adatom densities on GaAs: Evidence for near-equilibrium growth

被引:100
作者
Tersoff, J
Johnson, MD
Orr, BG
机构
[1] LAWRENCE LIVERMORE NATL LAB,LIVERMORE,CA 94551
[2] UNIV MICHIGAN,HARRISON M RANDALL LAB,ANN ARBOR,MI 48109
关键词
D O I
10.1103/PhysRevLett.78.282
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We examine the equilibrium of a compound semiconductor surface under molecular beam epitaxy (MBE) conditions, both theoretically and experimentally. For GaAs, the Ga chemical potential and adatom density depend sensitively on As pressure as well as temperature. Our results suggest that MBE growth may take place under conditions much closer to equilibrium than has been believed. We also show that standard one-component models cannot, even in principle, reproduce both the adatom density and its temperature dependence.
引用
收藏
页码:282 / 285
页数:4
相关论文
共 12 条
[1]   GROWTH FLUX RATIO DEPENDENCE OF MICROWAVE DEVICES IN MOLECULAR-BEAM EPITAXY [J].
CHOU, YC ;
LEE, CT ;
JUANG, FY ;
CHANG, CC ;
CHOU, K .
APPLIED PHYSICS LETTERS, 1989, 54 (21) :2109-2111
[2]   SURFACE-DIFFUSION LENGTH OBSERVED BY INSITU SCANNING MICROPROBE REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION [J].
HATA, M ;
WATANABE, A ;
ISU, T .
JOURNAL OF CRYSTAL GROWTH, 1991, 111 (1-4) :83-87
[3]   Adatom concentration on GaAs(001) during MBE annealing [J].
Johnson, MD ;
Leung, KT ;
Birch, A ;
Orr, BG ;
Tersoff, J .
SURFACE SCIENCE, 1996, 350 (1-3) :254-258
[4]   Atomic scale studies of epitaxial growth processes using X-ray techniques [J].
Kisker, DW ;
Stephenson, GB ;
Tersoff, J ;
Fuoss, PH ;
Brennan, S .
JOURNAL OF CRYSTAL GROWTH, 1996, 163 (1-2) :54-59
[5]  
REIF F, 1965, FUNDAMENTALS STATIST
[6]   ARSENIC PRESSURE-DEPENDENCE OF SURFACE-DIFFUSION OF GA ON NONPLANAR GAAS SUBSTRATES [J].
SHEN, XQ ;
KISHIMOTO, D ;
NISHINAGA, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (1A) :11-17
[7]   STEP-DENSITY VARIATIONS AND REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION INTENSITY OSCILLATIONS DURING EPITAXIAL-GROWTH ON VICINAL GAAS(001) [J].
SHITARA, T ;
VVEDENSKY, DD ;
WILBY, MR ;
ZHANG, J ;
NEAVE, JH ;
JOYCE, BA .
PHYSICAL REVIEW B, 1992, 46 (11) :6815-6824
[8]   MISORIENTATION DEPENDENCE OF EPITAXIAL-GROWTH ON VICINAL GAAS(001) [J].
SHITARA, T ;
VVEDENSKY, DD ;
WILBY, MR ;
ZHANG, J ;
NEAVE, JH ;
JOYCE, BA .
PHYSICAL REVIEW B, 1992, 46 (11) :6825-6833
[9]   STEP-EDGE BARRIERS ON GAAS(001) [J].
SMILAUER, P ;
VVEDENSKY, DD .
PHYSICAL REVIEW B, 1993, 48 (23) :17603-17606
[10]   Nucleation in Si(001) homoepitaxial growth [J].
Theis, W ;
Tromp, RM .
PHYSICAL REVIEW LETTERS, 1996, 76 (15) :2770-2773