Is Your Layout Density Verification Exact? - A Fast Exact Algorithm For Density Calculation

被引：0

作者：

Xiang, Hua ^{[1
]}

Chao, Kai-Yuan ^{[2
]}

Puri, Ruchir ^{[1
]}

Wong, Martin D. F. ^{[3
]}

机构：

[1] IBM TJ Watson, Yorktown Hts, NY USA

[2] Intel Corp, Digital Enterprise Grp, Enterprise Microprocessor Grp, Hillsboro, OR 97124 USA

[3] Univ Illinois, Dept Elect & Comp Sci, Urbana, IL 61801 USA

来源：

ISPD'07: PROCEEDINGS OF THE 2007 INTERNATIONAL SYMPOSIUM ON PHYSICAL DESIGN | 2007年

关键词：

density; fix-dissection; DFM;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

As the device shapes keep shrinking, the designs are more sensitive to manufacturing processes. In order to improve performance predictability and yield, mask layout uniformity/evenness is highly desired, and it is usually measured by the feature density with defined feasible range in manufacture process design rules. To address the density control problem, one fundamental problem is how to calculate density accurately and efficiently. In this paper, we propose a fast exact algorithm to identify the maximum density for a given layout. Compared with the existing exact algorithms, our algorithm reduces the running time from days/hours to a few minutes/seconds. And it is even faster than the existing approximate algorithms in literature.

引用

页码：19 / +

页数：2

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