共 11 条
[1]
Born M., 1999, PRINCIPLES OPTICS, P523
[2]
DEBISSCHOP P, COMMUNICATION
[3]
CD vs. pitch across the slit for multiple 248nm step & scan exposure tools
[J].
OPTICAL MICROLITHOGRAPHY XV, PTS 1 AND 2,
2002, 4691
:227-239
[4]
Theory of high-NA imaging in homogeneous thin films
[J].
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION,
1996, 13 (01)
:53-64
[5]
Graeupner P., 2003, P SOC PHOTO-OPT INS, V5040, P119
[6]
*ITRS, 2003, ITRS ROADM
[8]
Optimum mask and source patterns to print a given shape
[J].
OPTICAL MICROLITHOGRAPHY XIV, PTS 1 AND 2,
2001, 4346
:486-502
[9]
*SIGMA C, SOL C COMM PROD SIGM
[10]
Zernike F, 1934, PHYSICA, V1, P689