Survey on Run-to-Run Control Algorithms in High-Mix Semiconductor Manufacturing Processes

被引:33
|
作者
Tan, Fei [1 ]
Pan, Tianhong [1 ]
Li, Zhengming [1 ]
Chen, Shan [1 ]
机构
[1] Jiangsu Univ, Sch Elect & Informat Engn, Zhenjiang 212013, Peoples R China
基金
中国国家自然科学基金;
关键词
Exponentially weighted moving average (EWMA); high-mix production; nonthreaded EWMA; run-to-run (R2R) control; threaded EWMA; ADAPTIVE DISTURBANCE ESTIMATION; CONTROL PERFORMANCE ASSESSMENT; VARIABLE EWMA CONTROLLER; STATE ESTIMATION; METROLOGY DELAY; BATCH PROCESSES; CMP PROCESS; PRODUCT; OVERLAY; STABILITY;
D O I
10.1109/TII.2015.2490039
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
Recently, to ensure product quality in high-mix semiconductor manufacturing processes, run-to-run (R2R) control algorithms have received increasing attention. Difficult challenges have been met with new and advanced approaches that address the real-world operating conditions exhibited in high-mix production environments (e.g., different products with different frequencies and high numbers of threads). In this paper, various proposed controllers for high-mix semiconductor manufacturing processes are surveyed from an application and theoretical point of view. Remaining challenges and directions for future work are also summarized with the intent of drawing attention to these problems in the systems and process control communities.
引用
收藏
页码:1435 / 1444
页数:10
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