Birefringence free planar optical waveguide made by flame hydrolysis deposition (FHD) through tailoring of the overcladding

被引:66
作者
Kilian, A [1 ]
Kirchhof, J
Kuhlow, B
Przyrembel, G
Wischmann, W
机构
[1] Inst Phys Hochtechnol EV, D-07745 Jena, Germany
[2] Heinrich Hertz Inst Nachrichtentech Berlin GmbH, D-1000 Berlin, Germany
[3] Alcatel Corp Res Ctr, Stuttgart, Germany
关键词
arrayed waveguide grating; birefrigence; flame hydrolysis deposition (FHD); planar optical waveguides;
D O I
10.1109/50.822792
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Stresses developing in a planar waveguide resulting from the different thermal expansion coefficients of the substrate and the three glass layers (buffer, core and cladding) were analyzed using a finite element method. It can be shown that mainly the thermal expansion of the overcladding determines the birefringence in the finished waveguide, Based on that result, recipes for an overcladding made with the flame-hydrolysis-deposition-(FHD)-process were devised. We demonstrate the absence of birefringence in a commercial waveguide layer overclad with this glass, The high doping levels required for the cladding to have a thermal expansion coefficient sufficient for this raises concerns about the moisture sensitivity of such a glass. We examined the depth dependent composition of the glass using WD-ESCA (wavelength dispersive electron microprobe) and show, that at the surface a layer depleted of dopants is formed during the high temperature sintering process. This layer can serve as a protective coating to isolate the underlying, higher doped layer from the effects of moisture. Analysis of the stresses shows that this does not effect the birefringence behavior of the waveguide.
引用
收藏
页码:193 / 198
页数:6
相关论文
共 12 条
  • [1] [Anonymous], 1992, GLASCHEMIE, DOI DOI 10.1007/978-3-662-07499-2
  • [2] GREEN B, Patent No. 5506925
  • [3] HENRY C, Patent No. 5341444
  • [4] POLARIZATION MODE CONVERTER WITH POLYIMIDE HALF WAVEPLATE IN SILICA-BASED PLANAR LIGHTWAVE CIRCUITS
    INOUE, Y
    OHMORI, Y
    KAWACHI, M
    ANDO, S
    SAWADA, T
    TAKAHASHI, H
    [J]. IEEE PHOTONICS TECHNOLOGY LETTERS, 1994, 6 (05) : 626 - 628
  • [5] Recent progress in silica-based planar lightwave circuits on silicon
    Kawachi, M
    [J]. IEE PROCEEDINGS-OPTOELECTRONICS, 1996, 143 (05): : 257 - 262
  • [6] KAWACHI M, Patent No. 4781424
  • [7] LI YP, 1996, I ELECT ENG P OPTOEL, V143, P262
  • [8] MAISSEL L, 1960, J APPL PHYS, V31, P22
  • [9] Simple method of fabricating polarisation-insensitive and very low crosstalk AWG grating devices
    Ojha, SM
    Cureton, C
    Bricheno, T
    Day, S
    Moule, D
    Bell, AJ
    Taylor, J
    [J]. ELECTRONICS LETTERS, 1998, 34 (01) : 78 - 79
  • [10] STRESS-INDUCED INDEX PROFILE DISTORTION IN OPTICAL-WAVEGUIDES
    SCHERER, GW
    [J]. APPLIED OPTICS, 1980, 19 (12): : 2000 - 2006