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Ultra-small platinum and gold nanoparticles by arc plasma deposition
被引:19
|作者:
Kim, Sang Hoon
[1
]
Jeong, Young Eun
[1
]
Ha, Heonphil
[1
]
Byun, Ji Young
[1
]
Kim, Young Dok
[2
]
机构:
[1] Korea Inst Sci & Technol, Ctr Mat Architecturing, Seoul 136791, South Korea
[2] Sungkyunkwan Univ, Dept Chem, Suwon 440746, South Korea
关键词:
Nanoparticles;
Interfaces;
Pt;
Au;
Arc plasma deposition;
VACUUM;
MULTILAYERS;
EROSION;
METALS;
D O I:
10.1016/j.apsusc.2014.01.072
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
Ultra-small (< 2 nm) nanoparticles of platinum and gold were produced by arc plasma deposition (APD) in a systematic way and the deposition behavior was studied. Nanoparticles were deposited on two dimensional amorphous carbon and amorphous titania thin films and characterized by transmission electron microscopy (TEM). Deposition behavior of nanoparticles by APD was studied with discharge voltage (V), discharge condenser capacitance (C), and the number of plasma pulse shots (n) as controllable parameters. The average size of intrinsic nanoparticles generated by APD process was as small as 0.9 nm and deposited nanoparticles began to have crystal structures from the particle size of about 2 nm. V was the most sensitive parameter to control the size and coverage of generated nanoparticles compared to C and n. Size of APD deposited nanoparticles was also influenced by the nature of evaporating materials and substrates. (C) 2014 Elsevier B.V. All rights reserved.
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页码:52 / 58
页数:7
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