Structure and magnetic properties of Co80Cr20/Ti90Cr10 film prepared by pulsed-laser deposition

Ti90Cr10 and Co-80 Cr-20/Ti-90 Cr-10 thin films were prepared by pulsed laser deposition On Si ( 100) substrate at various temperatures. The relations between crystal structure and substrate temperature were investigated by XRD and the result revealed that as the substrate temperature increased, the film changed from amorphous state to crystal state gradually. Furthermore, the grain size and lattice parameters of Ti-90 Cr-10 film were measured by the XRD spectrum. The surface and cross-sectional morphology of Ti90Cr10 film were characterized by TEM. The hardness, as well as boundary adhesion strength of the Ti90Cr10 film was measured by nano-indenter and the result indicates that increase of the substrate temperature is beneficial to increasing the adhesion of the film. The magnetic properties of Co-80 Cr-20 /Ti-90 Cr-10 film were studied by VSM and the coercivity was observed to increase with decreasing film thickness. For the Co-80 Cr-20 (8nm)/Ti-90 Cr-10 (14 nm) film prepared at substrate temperature of 600 degrees C in vacuum, its coercivity is 65.25 kA/m and the squareness is about 0.86. Finally, the magnetization properties of the Co80Cr20/Tiq(0)Cr(10) are also discussed.