CVD Synthesis of Small-Diameter Single-Walled Carbon Nanotubes on Silicon

A simple process for the chemical vapor deposition of ultra SD single-wall carbon nanotubes has been developed. In this process, an iron nitrate nonahydrate solution in isopropyl alcohol with a concentration of (400 mu gr/milt) was used to catalyst nanoparticle formation on an oxidized silicon wafer. The oxide on the substrate was made of a thick layer of wet oxide sandwiched between two thin layers of dry oxide. The process results in semiconducting Single-Walled carbon NanoTabes (SWNTs) with diameters of less than 0.7 nm and more than a 1 ev band gap energy, which are amongst the smallest diameters of SWNTs ever reported.