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Local resonant conductance in magnetic tunnel junctions
被引:3
|作者:
Kechrakos, D
[1
]
Tsymbal, EY
Pettifor, DG
机构:
[1] NCSR Demokritos, Inst Mat Sci, Athens 15310, Greece
[2] Univ Oxford, Dept Mat, Oxford OX1 3PH, England
关键词:
magnetic tunnel junctions;
impurities;
resonant tunneling;
tight-binding calculation;
D O I:
10.1016/S0304-8853(01)01070-8
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Using a simple tight-binding model and the Kubo formula we have calculated the lateral distribution of the tunneling conductance across a magnetic tunnel junction probed by scanning tunneling microscopy. We find that the presence of an impurity within the barrier layer can cause a sharp spike in the conductance distribution, in agreement with recent experiments. (C) 2002 Elsevier Science B.V. All rights reserved.
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页码:457 / 460
页数:4
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