Ion Energy Distribution Skew Control Using Phase-Locked Harmonic RF Bias DriveIon Energy Distribution Skew Control Using Phase-Locked Harmonic RF Bias Drive

被引:30
作者
Coumou, David J. [1 ]
Clark, David Hamilton [2 ]
Kummerer, Theresa [2 ]
Hopkins, Michael [3 ]
Sullivan, Donal [3 ]
Shannon, Steven [2 ]
机构
[1] MKS Instruments Inc, Rochester, NY 14623 USA
[2] N Carolina State Univ, Dept Nucl Engn, Raleigh, NC 27695 USA
[3] Impedans Ltd, Dublin 17, Ireland
基金
美国国家科学基金会;
关键词
Automatic control; digital control; digital filters; frequency-locked loops; ion energy distribution function (IEDF); phase frequency detector; phase-locked loops; plasma density; plasma properties; plasma sheaths; plasmas; radio frequency (RF); real-time systems; RF signals; SHEATH MODEL; PLASMA;
D O I
10.1109/TPS.2014.2326600
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The energy distribution of ions accelerated through a radio frequency sheath and incident on a plasma-facing material significantly influences material interaction with the plasma and can impact manufacturing at the nanoscale. Ion energy distributions are controlled through appropriate mixing of drive frequencies, which has been shown to control distribution width. This paper presents a modification to multifrequency drive for ion energy control by exploiting a digital frequency and phase controller that enables modification of the higher order moments of the distribution, specifically, controlling the skew of the distribution. By modulating the sheath with two frequencies where one frequency is the harmonic of the other and controlling the relative phase of these two waveforms incident on the plasma-facing surface, skew control is achieved. A simple empirical model is presented to describe this method, as well as experimental validation of the model and demonstration of skew control in a parallel plate capacitively coupled reactor.
引用
收藏
页码:1880 / 1893
页数:14
相关论文
共 24 条
[11]   AN ECONOMICAL CLASS OF DIGITAL-FILTERS FOR DECIMATION AND INTERPOLATION [J].
HOGENAUER, EB .
IEEE TRANSACTIONS ON ACOUSTICS SPEECH AND SIGNAL PROCESSING, 1981, 29 (02) :155-162
[12]   Ion energy distributions in rf sheaths; review, analysis and simulation [J].
Kawamura, E ;
Vahedi, V ;
Lieberman, MA ;
Birdsall, CK .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1999, 8 (03) :R45-R64
[13]   Development of large-area a-Si:H films deposition using controlled VHF plasma [J].
Kawamura, K ;
Mashima, H ;
Takeuchi, Y ;
Takano, A ;
Noda, M ;
Yonekura, Y ;
Takatsuka, H .
THIN SOLID FILMS, 2006, 506 :22-26
[14]   ANALYTICAL SOLUTION FOR CAPACITIVE RF SHEATH [J].
LIEBERMAN, MA .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1988, 16 (06) :638-644
[15]  
Liu J., 2005, P 26 INT S DRY PROC, P359
[16]   Plasma sheath model and ion energy distribution for all radio frequencies [J].
Panagopoulos, T ;
Economou, DJ .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (07) :3435-3443
[17]   Tailored ion energy distributions at an rf-biased plasma electrode [J].
Qin, X. V. ;
Ting, Y-H ;
Wendt, A. E. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2010, 19 (06)
[18]  
Rahman M. T., 2012, 2012 7th International Conference on Electrical & Computer Engineering (ICECE), P721, DOI 10.1109/ICECE.2012.6471652
[19]   REVIEW OF PLASMA-ASSISTED DEPOSITION PROCESSES [J].
RANDHAWA, H .
THIN SOLID FILMS, 1991, 196 (02) :329-349
[20]   The electrical asymmetry effect in capacitively coupled radio frequency discharges - measurements of dc self bias, ion energy and ion flux [J].
Schulze, J. ;
Schuengel, E. ;
Czarnetzki, U. .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2009, 42 (09)