The effect of strain induced by Ag underlayer on saturation magnetization of partially ordered Fe16N2 thin films

被引：15

作者：

Yang, Meiyin ^{[1
,2
]}

Allard, Lawrence F. ^{[3
]}

Ji, Nian ^{[2
]}

Zhang, Xiaowei ^{[2
]}

Yu, Guang-Hua ^{[1
]}

Wang, Jian-Ping ^{[2
]}

机构：

[1] Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China

[2] Univ Minnesota, Ctr Micromagnet & Informat Technol MINT, Dept Elect & Comp Engn, Minneapolis, MN 55455 USA

[3] Oak Ridge Natl Lab, Mat Sci & Technol Div, High Temp Mat Lab, Oak Ridge, TN 37831 USA

来源：

APPLIED PHYSICS LETTERS | 2013年 / 103卷 / 24期

基金：

美国国家科学基金会;

关键词：

MOMENT; NITRIDE; IRON;

D O I：

10.1063/1.4847315

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Partially ordered Fe-N thin films were grown by a facing target sputtering process on the surface of a (001) Ag underlayer on MgO substrates. It was confirmed by x-ray diffraction that the Ag layer enlarged the in-plane lattice of the Fe-N thin films. Domains of the ordered alpha''-Fe16N2 phase within an epitaxial (001) alpha'-FexN phase were identified by electron diffraction and high-resolution aberration-corrected scanning transmission electron microscopy (STEM) methods. STEM dark-field and bright-field images showed the fully ordered structure of the alpha''-Fe16N2 at the atomic column level. High saturation magnetization(Ms) of 1890 emu/cc was obtained for alpha''-Fe16N2 on the Ag underlayer, while only 1500 emu/cc was measured for Fe-N on the Fe underlayer. The results are likely due to a tensile strain induced in the alpha''-Fe16N2 phase by the Ag structure at the interface. (C) 2013 AIP Publishing LLC.

引用

页数：4

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