Comparison of photoemission performance of AlGaN/GaN photocathodes with different GaN thickness

被引:6
|
作者
Hao, Guanghui [1 ]
Chen, Xinlong [1 ]
Chang, Benkang [1 ]
Fu, Xiaoqian [1 ,2 ]
Zhang, Yijun [1 ]
Yang, Mingzhu [1 ]
Zhang, Junju [1 ]
机构
[1] Nanjing Univ Sci & Technol, Dept Elect Engn & Optoelect Technol, Nanjing 210094, Jiangsu, Peoples R China
[2] Univ Jinan, Sch Informat Sci & Engn, Jinan 250022, Peoples R China
来源
OPTIK | 2014年 / 125卷 / 03期
关键词
Photocathode; Photoemission performance; Quantum efficiency; QUANTUM EFFICIENCY; ALLOYS; FILMS; ALN;
D O I
10.1016/j.ijleo.2013.08.024
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In view of the different photoemission performance of AlGaN/GaN photocathode with different GaN thickness, three kinds of AlGaN/GaN photocathodes with different GaN layer. The GaN layer thickness of the AlGaN/GaN photocathodes is 7.5 nm, 2 nm and 0 nm. The reflectivity and transmittance has tested, and got absortivity of them. The Cs/O activation results and quantum efficiency fitted results show that AlGaN/GaN photocathodes with a thick GaN layer can achieve higher photoemission and surface electron escape probability, and the quantum efficiency of them is 14.7%, 12.8% and 7.6% at 250 nm. But the UV/solar rejection ratio is increasing along with the thickness of GaN decline. (C) 2013 Elsevier GmbH. All rights reserved.
引用
收藏
页码:1377 / 1379
页数:3
相关论文
共 50 条
  • [31] Electrical Double-Layer Modeling of Different Al-Content on the Performance of AlGaN/GaN HEMTs
    Mao, Ling-Feng
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2018, 7 (09) : P496 - P500
  • [32] Influence of dislocations in the GaN layer on the electrical properties of an AlGaN/GaN heterostructure
    Gao Zhi-Yuan
    Hao Yue
    Zhang Jin-Cheng
    Li Pei-Xian
    Gu Wen-Ping
    CHINESE PHYSICS B, 2009, 18 (11) : 4970 - 4975
  • [33] Study on Photoemission Surface of Varied Doping GaN Photocathode
    Qiao, Jianliang
    Du, Ruijuan
    Ding, Huan
    Gao, Youtang
    Chang, Benkang
    7TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTOELECTRONICS MATERIALS AND DEVICES FOR SENSING AND IMAGING, 2014, 9284
  • [34] Study of photoemission mechanism for varied doping GaN photocathode
    Qiao, Jianliang
    Xu, Yuan
    Niu, Jun
    Gao, Youtang
    Chang, Benkang
    AOPC 2015: OPTICAL AND OPTOELECTRONIC SENSING AND IMAGING TECHNOLOGY, 2015, 9674
  • [35] Dependence of process damage on GaN channel thickness in AlGaN/GaN high-electron-mobility transistors with back-barrier layers
    Ito, Yoshikaze
    Tamai, Seita
    Hoshi, Takuya
    Gotow, Takahiro
    Miyamoto, Yasuyuki
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2023, 62 (SC)
  • [36] Study of spectral response for transmission-mode NEA GaN photocathodes
    Wang Xiao-Hui
    Chang Ben-Kang
    Qian Yun-Sheng
    Gao Pin
    Zhang Yi-Jun
    Qiao Jian-Liang
    Du Xiao-Qing
    ACTA PHYSICA SINICA, 2011, 60 (05)
  • [37] GaN/AlGaN nanostructures for intersubband optoelectronics
    Tchernycheva, M.
    Macchadani, H.
    Nevou, L.
    Mangeney, J.
    Julien, F. H.
    Kandaswamy, P. K.
    Wirthmueller, A.
    Monroy, E.
    Vardi, A.
    Schacham, S.
    Bahir, G.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2010, 207 (06): : 1421 - 1424
  • [38] Assembly of phosphonic acids on GaN and AlGaN
    Simpkins, B. S.
    Hong, S.
    Stine, R.
    Maekinen, A. J.
    Theodore, N. D.
    Mastro, M. A.
    Eddy, C. R., Jr.
    Pehrsson, P. E.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2010, 43 (01)
  • [39] Effects of Dielectric Passivation on Device Performance of AlGaN/GaN High-Electron-Mobility Transistors
    Kim, Jaeho
    Oh, Jaejoon
    Kim, Jongseob
    Cho, Jaehee
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2021, 10 (05)
  • [40] Comparison of GaN/AlGaN/AlN/GaN HEMTs Grown on Sapphire with Fe-Modulation-Doped and Unintentionally Doped GaN Buffer: Material Growth and Device Fabrication
    Gong, Jia-Min
    Wang, Quan
    Yan, Jun-Da
    Liu, Feng-Qi
    Feng, Chun
    Wang, Xiao-Liang
    Wang, Zhan-Guo
    CHINESE PHYSICS LETTERS, 2016, 33 (11)