Comparison of photoemission performance of AlGaN/GaN photocathodes with different GaN thickness

被引:6
|
作者
Hao, Guanghui [1 ]
Chen, Xinlong [1 ]
Chang, Benkang [1 ]
Fu, Xiaoqian [1 ,2 ]
Zhang, Yijun [1 ]
Yang, Mingzhu [1 ]
Zhang, Junju [1 ]
机构
[1] Nanjing Univ Sci & Technol, Dept Elect Engn & Optoelect Technol, Nanjing 210094, Jiangsu, Peoples R China
[2] Univ Jinan, Sch Informat Sci & Engn, Jinan 250022, Peoples R China
来源
OPTIK | 2014年 / 125卷 / 03期
关键词
Photocathode; Photoemission performance; Quantum efficiency; QUANTUM EFFICIENCY; ALLOYS; FILMS; ALN;
D O I
10.1016/j.ijleo.2013.08.024
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In view of the different photoemission performance of AlGaN/GaN photocathode with different GaN thickness, three kinds of AlGaN/GaN photocathodes with different GaN layer. The GaN layer thickness of the AlGaN/GaN photocathodes is 7.5 nm, 2 nm and 0 nm. The reflectivity and transmittance has tested, and got absortivity of them. The Cs/O activation results and quantum efficiency fitted results show that AlGaN/GaN photocathodes with a thick GaN layer can achieve higher photoemission and surface electron escape probability, and the quantum efficiency of them is 14.7%, 12.8% and 7.6% at 250 nm. But the UV/solar rejection ratio is increasing along with the thickness of GaN decline. (C) 2013 Elsevier GmbH. All rights reserved.
引用
收藏
页码:1377 / 1379
页数:3
相关论文
共 50 条
  • [21] High performance AlGaN/GaN HEMTs with AlN/SiNx passivation
    Tan Xin
    Lu Yuanjie
    Gu Guodong
    Wang Li
    Dun Shaobo
    Song Xubo
    Guo Hongyu
    Yin Jiayun
    Cai Shujun
    Feng Zhihong
    JOURNAL OF SEMICONDUCTORS, 2015, 36 (07)
  • [22] High performance AlGaN/GaN HEMTs with AlN/SiNx passivation
    谭鑫
    吕元杰
    顾国栋
    王丽
    敦少博
    宋旭波
    郭红雨
    尹甲运
    蔡树军
    冯志红
    Journal of Semiconductors, 2015, (07) : 98 - 101
  • [23] AlGaN/GaN Heterostructures Electrical Performance by Altering GaN/Sapphire Buffers Growth Pressure and Low-Temperature GaN Interlayers Application
    Wosko, Mateusz
    Paszkiewicz, Bogdan
    Paszkiewicz, Regina
    CRYSTAL RESEARCH AND TECHNOLOGY, 2021, 56 (12)
  • [24] Growth and characterization of GaN/AlGaN heterostructures on GaN substrate templates
    Hubbard, Lance
    Dietz, Nikolaus
    Vernon, Mark
    Collazoc, Ramon
    Mita, Seiji
    Kirste, Ronny
    Sitar, Zlatko
    Woods, Vincent T.
    SIXTEENTH INTERNATIONAL CONFERENCE ON SOLID STATE LIGHTING AND LED-BASED ILLUMINATION SYSTEMS, 2017, 10378
  • [25] Atomic Layer Deposition of AlGaN on GaN and Current Transport Mechanism in AlGaN/GaN Schottky Diodes
    Kim, Hogyoung
    Yun, Hee Ju
    Choi, Seok
    Choi, Byung Joon
    MATERIALS TRANSACTIONS, 2020, 61 (01) : 88 - 93
  • [26] Novel Cs-Free GaN Photocathodes
    Tripathi, Neeraj
    Bell, L. D.
    Nikzad, Shouleh
    Tungare, Mihir
    Suvarna, Puneet H.
    Sandvik, Fatemeh Shahedipour
    JOURNAL OF ELECTRONIC MATERIALS, 2011, 40 (04) : 382 - 387
  • [27] Novel Cs-Free GaN Photocathodes
    Neeraj Tripathi
    L. D. Bell
    SHOULEH Nikzad
    Mihir Tungare
    Puneet H. Suvarna
    Fatemeh Shahedipour Sandvik
    Journal of Electronic Materials, 2011, 40 : 382 - 387
  • [28] Effect of p-GaN layer thickness on the performance of p-i-n structure GaN ultraviolet photodetectors
    Zhou Mei
    Zhao De-Gang
    ACTA PHYSICA SINICA, 2008, 57 (07) : 4570 - 4574
  • [29] Comparative study of AlGaN/GaN heterostructures grown on different sapphire substrates
    Li, Wen
    Xu, Shengrui
    Zhang, Yachao
    Peng, Ruoshi
    Zhao, Ying
    Du, Jinjuan
    Fan, Xiaomeng
    Zhang, Jincheng
    Tao, Hongchang
    Wang, Xuewei
    Hao, Yue
    SUPERLATTICES AND MICROSTRUCTURES, 2019, 134
  • [30] Suitability of thin-GaN for AlGaN/GaN HEMT material and device
    Narang, Kapil
    Singh, Vikash K.
    Pandey, Akhilesh
    Khan, Ruby
    Bag, Rajesh K.
    Rawal, D. S.
    Padmavati, M. V. G.
    Tyagi, Renu
    Singh, Rajendra
    JOURNAL OF MATERIALS SCIENCE, 2022, 57 (10) : 5913 - 5923