In view of the different photoemission performance of AlGaN/GaN photocathode with different GaN thickness, three kinds of AlGaN/GaN photocathodes with different GaN layer. The GaN layer thickness of the AlGaN/GaN photocathodes is 7.5 nm, 2 nm and 0 nm. The reflectivity and transmittance has tested, and got absortivity of them. The Cs/O activation results and quantum efficiency fitted results show that AlGaN/GaN photocathodes with a thick GaN layer can achieve higher photoemission and surface electron escape probability, and the quantum efficiency of them is 14.7%, 12.8% and 7.6% at 250 nm. But the UV/solar rejection ratio is increasing along with the thickness of GaN decline. (C) 2013 Elsevier GmbH. All rights reserved.
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Hebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R ChinaHebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R China
Tan Xin
Lu Yuanjie
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Hebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R ChinaHebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R China
Lu Yuanjie
Gu Guodong
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Hebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R ChinaHebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R China
Gu Guodong
Wang Li
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China Natl Def Sci Technol Informat Ctr, Beijing 100040, Peoples R ChinaHebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R China
Wang Li
Dun Shaobo
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Hebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R ChinaHebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R China
Dun Shaobo
Song Xubo
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Hebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R ChinaHebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R China
Song Xubo
Guo Hongyu
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Hebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R ChinaHebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R China
Guo Hongyu
Yin Jiayun
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Hebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R ChinaHebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R China
Yin Jiayun
Cai Shujun
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Hebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R ChinaHebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit A, Shijiazhuang 050051, Hebei, Peoples R China
Cai Shujun
Feng Zhihong
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National Key Laboratory of Application Specific Integrated Circuit (ASIC),Hebei Semiconductor Research InstituteNational Key Laboratory of Application Specific Integrated Circuit (ASIC),Hebei Semiconductor Research Institute
谭鑫
吕元杰
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National Key Laboratory of Application Specific Integrated Circuit (ASIC),Hebei Semiconductor Research InstituteNational Key Laboratory of Application Specific Integrated Circuit (ASIC),Hebei Semiconductor Research Institute
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顾国栋
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National Key Laboratory of Application Specific Integrated Circuit (ASIC),Hebei Semiconductor Research InstituteNational Key Laboratory of Application Specific Integrated Circuit (ASIC),Hebei Semiconductor Research Institute
顾国栋
王丽
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China National Defense Sciences Technology Information CenterNational Key Laboratory of Application Specific Integrated Circuit (ASIC),Hebei Semiconductor Research Institute
王丽
敦少博
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宋旭波
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郭红雨
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尹甲运
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National Key Laboratory of Application Specific Integrated Circuit (ASIC),Hebei Semiconductor Research InstituteNational Key Laboratory of Application Specific Integrated Circuit (ASIC),Hebei Semiconductor Research Institute
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蔡树军
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冯志红
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National Key Laboratory of Application Specific Integrated Circuit (ASIC),Hebei Semiconductor Research InstituteNational Key Laboratory of Application Specific Integrated Circuit (ASIC),Hebei Semiconductor Research Institute
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Seoul Natl Univ Sci & Technol, Dept Mat Sci & Engn, Seoul 01811, South KoreaSeoul Natl Univ Sci & Technol, Dept Visual Opt, Seoul 01811, South Korea
Choi, Seok
Choi, Byung Joon
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Seoul Natl Univ Sci & Technol, Dept Mat Sci & Engn, Seoul 01811, South KoreaSeoul Natl Univ Sci & Technol, Dept Visual Opt, Seoul 01811, South Korea
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China Agr Univ, Dept Phys, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
Zhou Mei
Zhao De-Gang
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Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
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Solid State Phys Lab, Lucknow Rd, Delhi 110054, India
Indian Inst Technol Delhi, Dept Phys, New Delhi 110016, IndiaSolid State Phys Lab, Lucknow Rd, Delhi 110054, India
Narang, Kapil
Singh, Vikash K.
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Khan, Ruby
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