Comparison of photoemission performance of AlGaN/GaN photocathodes with different GaN thickness

被引:6
|
作者
Hao, Guanghui [1 ]
Chen, Xinlong [1 ]
Chang, Benkang [1 ]
Fu, Xiaoqian [1 ,2 ]
Zhang, Yijun [1 ]
Yang, Mingzhu [1 ]
Zhang, Junju [1 ]
机构
[1] Nanjing Univ Sci & Technol, Dept Elect Engn & Optoelect Technol, Nanjing 210094, Jiangsu, Peoples R China
[2] Univ Jinan, Sch Informat Sci & Engn, Jinan 250022, Peoples R China
来源
OPTIK | 2014年 / 125卷 / 03期
关键词
Photocathode; Photoemission performance; Quantum efficiency; QUANTUM EFFICIENCY; ALLOYS; FILMS; ALN;
D O I
10.1016/j.ijleo.2013.08.024
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In view of the different photoemission performance of AlGaN/GaN photocathode with different GaN thickness, three kinds of AlGaN/GaN photocathodes with different GaN layer. The GaN layer thickness of the AlGaN/GaN photocathodes is 7.5 nm, 2 nm and 0 nm. The reflectivity and transmittance has tested, and got absortivity of them. The Cs/O activation results and quantum efficiency fitted results show that AlGaN/GaN photocathodes with a thick GaN layer can achieve higher photoemission and surface electron escape probability, and the quantum efficiency of them is 14.7%, 12.8% and 7.6% at 250 nm. But the UV/solar rejection ratio is increasing along with the thickness of GaN decline. (C) 2013 Elsevier GmbH. All rights reserved.
引用
收藏
页码:1377 / 1379
页数:3
相关论文
共 50 条
  • [11] Effect of recaesiation on quantum efficiency recovery for GaN photocathodes
    Su, Lingai
    Shen, Yang
    Chen, Liang
    Qian, Yunsheng
    Xu, Sunan
    Zhang, Shuqin
    OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS, 2016, 10 (11-12): : 907 - 911
  • [12] GaN photocathodes for UV detection and imaging
    Siegmund, OHW
    Tremsin, AS
    Martin, A
    Malloy, J
    Ulmer, M
    Wessels, B
    UV/EUV AND VISIBLE SPACE INSTRUMENTATION FOR ASTRONOMY II, 2003, 5164 : 134 - 143
  • [13] Comparison of AlGaN/GaN HEMTs Grown and Fabricated on Sapphire Substrate with AlN and GaN Nucleation Layers
    Gao, N.
    Fang, Y. L.
    Yin, J. Y.
    Wang, B.
    Guo, Y. M.
    He, Z. Z.
    Gu, G. D.
    Guo, H. Y.
    Feng, Z. H.
    Cai, S. J.
    2017 14TH CHINA INTERNATIONAL FORUM ON SOLID STATE LIGHTING (SSLCHINA) : INTERNATIONAL FORUM ON WIDE BANDGAP SEMICONDUCTORS (IFWS), 2017, : 195 - 199
  • [14] Nanoscale heterojunctions of InGaN/GaN photocathodes for electron sources
    Zhangyang, Xingyue
    Liu, Lei
    Tian, Jian
    Cheng, Hongchang
    Guo, Xin
    PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2024, 163
  • [15] Comparison of resolution characteristics between exponential-doping and uniform-doping GaN photocathodes
    Wang Hong-gang
    Qian Yun-sheng
    Lu Liu-bing
    Cheng Hong-chang
    Chang Ben-kang
    INTERNATIONAL SYMPOSIUM ON PHOTOELECTRONIC DETECTION AND IMAGING 2013: LOW-LIGHT-LEVEL TECHNOLOGY AND APPLICATIONS, 2013, 8912
  • [16] AlGaN/GaN field effect transistors for power electronics-Effect of finite GaN layer thickness on thermal characteristics
    Hodges, C.
    Calvo, J. Anaya
    Stoffels, S.
    Marcon, D.
    Kuball, M.
    APPLIED PHYSICS LETTERS, 2013, 103 (20)
  • [17] Performance enhancement of AlGaN/InGaN MQW LED with GaN/InGaN superlattice structure
    Saroosh, Rabia
    Tauqeer, Tauseef
    Afzal, Sara
    Mehmood, Haris
    IET OPTOELECTRONICS, 2017, 11 (04) : 156 - 162
  • [18] Photoemission of graded-doping GaN photocathode
    Fu Xiao-Qian
    Chang Ben-Kang
    Wang Xiao-Hui
    Li Biao
    Du Yu-Jie
    Zhang Jun-Ju
    CHINESE PHYSICS B, 2011, 20 (03)
  • [19] Photoemission of graded-doping GaN photocathode
    付小倩
    常本康
    王晓晖
    李飙
    杜玉杰
    张俊举
    Chinese Physics B, 2011, 20 (03) : 485 - 489
  • [20] In situ pendeoepitaxy of GaN using heteroepitaxial AlGaN/GaN cracks
    Moon, Y. T.
    Liu, C.
    Xie, J.
    Ni, X.
    Fu, Y.
    Morkoc, H.
    Zhou, Lin
    Smith, David J.
    APPLIED PHYSICS LETTERS, 2006, 89 (02)