Comparison of photoemission performance of AlGaN/GaN photocathodes with different GaN thickness

被引:6
|
作者
Hao, Guanghui [1 ]
Chen, Xinlong [1 ]
Chang, Benkang [1 ]
Fu, Xiaoqian [1 ,2 ]
Zhang, Yijun [1 ]
Yang, Mingzhu [1 ]
Zhang, Junju [1 ]
机构
[1] Nanjing Univ Sci & Technol, Dept Elect Engn & Optoelect Technol, Nanjing 210094, Jiangsu, Peoples R China
[2] Univ Jinan, Sch Informat Sci & Engn, Jinan 250022, Peoples R China
来源
OPTIK | 2014年 / 125卷 / 03期
关键词
Photocathode; Photoemission performance; Quantum efficiency; QUANTUM EFFICIENCY; ALLOYS; FILMS; ALN;
D O I
10.1016/j.ijleo.2013.08.024
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In view of the different photoemission performance of AlGaN/GaN photocathode with different GaN thickness, three kinds of AlGaN/GaN photocathodes with different GaN layer. The GaN layer thickness of the AlGaN/GaN photocathodes is 7.5 nm, 2 nm and 0 nm. The reflectivity and transmittance has tested, and got absortivity of them. The Cs/O activation results and quantum efficiency fitted results show that AlGaN/GaN photocathodes with a thick GaN layer can achieve higher photoemission and surface electron escape probability, and the quantum efficiency of them is 14.7%, 12.8% and 7.6% at 250 nm. But the UV/solar rejection ratio is increasing along with the thickness of GaN decline. (C) 2013 Elsevier GmbH. All rights reserved.
引用
收藏
页码:1377 / 1379
页数:3
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