Modified pulsed PECVD technique for nano-crystalline silicon solar cells: An effect of I-layer growth temperature

被引:0
|
作者
Das, UK [1 ]
Centurioni, E [1 ]
Morrison, S [1 ]
Williamson, DL [1 ]
Madan, A [1 ]
机构
[1] MNSyst Inc, Golden, CO 80401 USA
关键词
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暂无
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
The Pulsed PECVD technique allows an increase in the electron density during the 'ON' cycle, while in the 'OFF' cycle it neutralizes the ions responsible for dust formation in the plasma. We have developed a modified Pulsed PECVD technique, which has the inherent ability to reduce powder formation in the plasma and to grow nc-Si:H p-i-n solar cells. An efficiency of similar to7.5% (FF of 0.69) at an i-layer thickness of similar to1.4 mum has been obtained by optimizing the i-layer growth temperature. The 7.5% efficiency device is (220) oriented with I-220/I-111 value of similar to2.0 and exhibits no significant Si-O bonding in FTIR, which yields a hydrogen content of similar to7 at%.
引用
收藏
页码:1780 / 1783
页数:4
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