Effect of Co doping on leakage current has been investigated in capacitor consisting of Ba0.5Sr0.5Ti1-xCoxO3 (BSTC, x=0, 0.002, 0.010) thin film, Pt top electrode, and Nb-doped SrTiO3 (STON) bottom electrode. Co doping remarkably decreases the leakage current in BSTC thin film, such as from 9x10(-7) A in undoped thin film to 8x10(-11) A in 1.0 at. % Co-doped BSTC thin film at bias voltage of 6 V. In the case of the Pt electrode positively biased, the leakage current shows space-charge-limited-current behavior. The trap-filled-limit voltage and the calculated trapped electron density increase with Co concentration in BSTC thin film. The mechanism of the reduction of the leakage current by Co doping is discussed. (C) 2004 American Institute of Physics.
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SOA Deemed be Univ, Fac Engn & Technol, Dept Phys, ITER, Bhubaneswar, Odisha, IndiaSOA Deemed be Univ, Fac Engn & Technol, Dept Phys, ITER, Bhubaneswar, Odisha, India
Mohanty, Bhagyashree
Nayak, Nimai C.
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SOA Deemed be Univ, Fac Engn & Technol, Dept Chem, ITER, Bhubaneswar, Odisha, IndiaSOA Deemed be Univ, Fac Engn & Technol, Dept Phys, ITER, Bhubaneswar, Odisha, India
Nayak, Nimai C.
Parida, B. N.
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Deemed be Univ, Cent Inst Technol Kokrajhar, Dept Phys, MoE,Govt India, Btr 783370, Assam, IndiaSOA Deemed be Univ, Fac Engn & Technol, Dept Phys, ITER, Bhubaneswar, Odisha, India
Parida, B. N.
Parida, R. K.
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SOA Deemed be Univ, Fac Engn & Technol, Dept Phys, ITER, Bhubaneswar, Odisha, IndiaSOA Deemed be Univ, Fac Engn & Technol, Dept Phys, ITER, Bhubaneswar, Odisha, India
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
Kim, ID
Park, JH
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Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
Park, JH
Kim, HG
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Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
机构:
Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R ChinaHong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
Miao, J.
Wang, Y.
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
Wang, Y.
Tian, H. Y.
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
Tian, H. Y.
Zhou, X. Y.
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
Zhou, X. Y.
Chan, H. L. W.
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
Chan, H. L. W.
Choy, C. L.
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
Choy, C. L.
Cao, L. X.
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
Cao, L. X.
Zhao, B. R.
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China