Advanced applications in microphotonics using proton beam writing

被引：17

作者：

Bettiol, A. A. ^{[1
]}

Chiam, S. Y. ^{[1
]}

Teo, E. J. ^{[1
]}

Udalagama, C. ^{[1
]}

Chan, S. F. ^{[1
]}

Hoi, S. K. ^{[1
]}

van Kan, J. A. ^{[1
]}

Breese, M. B. H. ^{[1
]}

Watt, F. ^{[1
]}

机构：

[1] Natl Univ Singapore, Dept Phys, Ctr Ion Beam Applicat, Singapore 117542, Singapore

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2009年 / 267卷 / 12-13期

关键词：

Proton beam writing; Waveguides; Metamaterials; Silicon photonics; Lab-on-a-chip; CHANNEL WAVE-GUIDES; FABRICATION; SILICON; IRRADIATION; FREQUENCIES;

D O I：

10.1016/j.nimb.2009.03.035

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Proton beam writing (PBW) is a powerful tool for prototyping microphotonic structures in a wide variety of materials including polymers, insulators, semiconductors and metals. Prototyping is achieved either through direct fabrication with the proton beam, or by the fabrication of a master that can be used for replication. In recent times we have explored the use of PBW for various advanced optical applications including fabrication of subwavelength metallic structures and metamaterials, direct write of silicon waveguides for mid IR applications and integrated waveguides for lab-on-a-chip devices. This paper will review the recent progress made in these areas with particular emphasis on the main advantages of using the PBW technique for these novel applications. (c) 2009 Elsevier B.V. All rights reserved.

引用

页码：2280 / 2284

页数：5

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