Fabrication of TiO2 micro-structures by cathodic deposition

被引:5
|
作者
Chang, Tso-Fu Mark [1 ]
Sato, Tatsuo [1 ]
Sone, Masato [1 ]
机构
[1] Tokyo Inst Technol, Precis & Intelligence Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan
关键词
TiO2; Micro-structure; Cathodic deposition; SU-8; FILMS;
D O I
10.1016/j.mee.2014.03.033
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Fabrication of TiO2 micro-structures by combining photolithography with SU-8 photoresist and electrochemical cathodic deposition method was firstly demonstrated in this study. Diameter of the fabricated circular TiO2 micro-structures was ranged from 50 to 125 mu m, and surface morphology of the TiO2 was found to be porous. Shape of the micro-structures obtained is determined by shape of the SU-8 template prepared, therefore, it can be easily controlled by photolithography conditions. Morphology and crystal structures of the TiO2 micro-structures can be controlled by electrochemical parameters. Therefore, this result demonstrated the possibility to control properties of TiO2 micro-structures fabricated and the potential to improve performance of TiO2 micro-structures in applications. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:80 / 82
页数:3
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