Fabrication of TiO2 micro-structures by cathodic deposition

被引：5

作者：

Chang, Tso-Fu Mark ^{[1
]}

Sato, Tatsuo ^{[1
]}

Sone, Masato ^{[1
]}

机构：

[1] Tokyo Inst Technol, Precis & Intelligence Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan

来源：

MICROELECTRONIC ENGINEERING | 2014年 / 121卷

关键词：

TiO2; Micro-structure; Cathodic deposition; SU-8; FILMS;

D O I：

10.1016/j.mee.2014.03.033

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Fabrication of TiO2 micro-structures by combining photolithography with SU-8 photoresist and electrochemical cathodic deposition method was firstly demonstrated in this study. Diameter of the fabricated circular TiO2 micro-structures was ranged from 50 to 125 mu m, and surface morphology of the TiO2 was found to be porous. Shape of the micro-structures obtained is determined by shape of the SU-8 template prepared, therefore, it can be easily controlled by photolithography conditions. Morphology and crystal structures of the TiO2 micro-structures can be controlled by electrochemical parameters. Therefore, this result demonstrated the possibility to control properties of TiO2 micro-structures fabricated and the potential to improve performance of TiO2 micro-structures in applications. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：80 / 82

页数：3

共 10 条

[1]

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