Large anisotropic adatom kinetics on nonpolar GaN surfaces: Consequences for surface morphologies and nanowire growth

被引:170
作者
Lymperakis, Liverios [1 ]
Neugebauer, Joerg [1 ]
机构
[1] Max Planck Inst Eisenforsch GmbH, Dept Computat Mat Design, D-40237 Dusseldorf, Germany
关键词
adsorbed layers; density functional theory; diffusion barriers; gallium compounds; III-V semiconductors; nanowires; nucleation; surface morphology; wide band gap semiconductors; R-PLANE SAPPHIRE; FILMS; RECONSTRUCTIONS;
D O I
10.1103/PhysRevB.79.241308
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The diffusion barriers of Ga and N adatoms on the nonpolar a- and m-plane surfaces have been studied employing density-functional theory calculations. Our calculations reveal a strong in-plane anisotropy of the diffusion barriers for both surfaces: for the a-plane surface larger diffusion lengths parallel to the c axis are observed. For the m-plane surface the in-plane anisotropy is reversed, and significantly smaller barriers are found for diffusion normal to the [0001] direction. These results are consistent with the experimentally observed in plane growth anisotropy of the nonpolar GaN surfaces. Moreover, they indicate that the large aspect ratio achieved for c-axial GaN nanowires is not a consequence of a strong anisotropy in the adatom mobilities but is rather related to surface thermodynamics and nucleation.
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页数:4
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