Influence of Substrate Temperature and Post Annealing of CuGaO2 Thin Films on Optical and Structural Properties

被引：1
|
作者：
Abu Bakar, Muhammad Hafiz [1 ]
Li, Lam Mui [1 ]
Mohamad, Khairul Anuar [2 ]
Sulaiman, Salina [2 ]
Salleh, Saafie [1 ]
Alias, Afishah [1 ]
机构：
[1] Univ Malaysia Sabah, Fac Sci & Nat Resources, Kota Kinabalu 88999, Sabah, Malaysia
[2] Univ Malaysia Sabah, Fac Engn, Kota Kinabalu 88999, Sabah, Malaysia
来源：
PHYSICS AND MATERIALS SYMPOSIUM: INTERNATIONAL CONFERENCE ON APPLIED SCIENCES AND INDUSTRIAL TECHNOLOGY (ICASIT2015) | 2015年 / 1674卷
关键词：
RF sputtering; CuGaO2 thin films; FABRICATION;
D O I：
10.1063/1.4928837
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A transparent p-type thin film CuGaO2 was deposited by using RF sputtering deposition method on plastic (PET) and glass substrate. The characteristics of the film is investigated. The thin film was deposited at temperature range from 50-250 degrees C and the pressure inside the chamber is 1.0x10(-2) Torr and Argon gas was used as a working gas. The RF power is set to 100 W. The thickness of thin film is 300nm. In this experiment the transparency of the thin film is more than 70% for the visible light region. The band gap obtain is between 3.3 to 3.5 eV. The details of the results will be discussed in the conference.
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页数：5
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