Structural relaxation in sputter-deposited silica glass

被引：5

作者：

Hirose, Tomohiro ^{[1
]}

Saito, Kazuya ^{[1
]}

Ikushima, Akira J. ^{[1
]}

机构：

[1] Toyota Technol Inst, Res Ctr Adv Photon Technol, Frontier Mat Lab, Tempa Ku, Nagoya, Aichi 4688511, Japan

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 2006年 / 352卷 / 21-22期

关键词：

films and coatings; sputtering; optical properties; FTIR measurements; oxide glasses; silica; viscosity and relaxation; stress relaxation; structural relaxation; viscoelasticity; viscosity;

D O I：

10.1016/j.jnoncrysol.2006.02.056

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We investigated structural relaxation below the glass transition temperature in sputter-deposited silica glass. Structural relaxation was obtained from annealing behavior of the IR reflection structural band position. Results were compared with that of bulk silica glass. Results showed the following. (1) The structural relaxation time is 10(6) times shorter than that of bulk silica glass. (2) The activation energy is close to that of bulk silica glass. (3) Once the structural relaxation reaches a steady state, the structure of silica glass film resembles that of bulk silica glass. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：2198 / 2203

页数：6

共 28 条

[1] A SIMPLE IR SPECTROSCOPIC METHOD FOR DETERMINING FICTIVE TEMPERATURE OF SILICA GLASSES [J].