A 193nm excimer laser microstepper system

被引：3

作者：

Rizvi, NH

Cashmore, JS

Solomon, CM

Rumsby, PT

Gower, MC

机构：

来源：

MICROLITHOGRAPHIC TECHNIQUES IN IC FABRICATION | 1997年 / 3183卷

关键词：

193nm lithography; excimer laser; 300mm wafers; photoresists;

D O I：

10.1117/12.280529

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

An excimer laser microstepper, intended for R&D studies of 193nm lithography, is described. System details such as the laser performance, beam transport, wafer handling and photoresist processes are outlined.

引用

页码：30 / 37

页数：8