Fabrication of broadband, high-efficiency, metal-multilayer-dielectric gratings

被引:19
|
作者
Chen, Hui [1 ]
Guan, Heyuan [2 ,3 ]
Zeng, Lijiang [1 ]
Jin, Yunxia [2 ]
机构
[1] Tsinghua Univ, Dept Precis Instrument, State Key Lab Precis Measurement Technol & Instru, Beijing 100084, Peoples R China
[2] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
[3] Chinese Acad Sci, Grad Sch, Beijing 100049, Peoples R China
关键词
Diffraction grating; Pulse compression; Microstructure fabrication; Metal-multilayer-dielectric grating; PULSE-COMPRESSION; COMPUTER-SIMULATION; EVOLUTION; PROFILES; DESIGN;
D O I
10.1016/j.optcom.2014.05.013
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Fabrication procedures and testing results of broadband, high-efficiency, metal-multilayer-dielectric gratings (MMDG) for high power laser pulse compression applications are reported. Gratings of 1740 line/mm line density to operate at 53 degrees incident angle and TE polarization were engraved in the top three layers of metal-multilayer-dielectric substrates. The groove depth was controlled to be between 310 nm and 320 nm by monitoring the diffraction efficiency of grating at-1st-order in Littrow mounting using a He-Ne laser with a wavelength of 632.8 nm. The duty cycles of masks was controlled with a range from 0.14 to 0.17 and the duly cycles of MMDGs was controlled with a range from 0.15 to 0.19. The bandwidth of a fabricated MMDG at a level of diffraction efficiency higher than 90% was 169 nm and the peak value was 95.1% at wavelength of 810 nm. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:103 / 108
页数:6
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