TCAD evaluation of single-event burnout hardening design for SiC Schottky diodes

被引:1
作者
Chen, Jia-Hao [1 ]
Wang, Ying [1 ]
Guo, Hao-min [1 ]
Fei, Xin-Xing [2 ]
Yu, Cheng-hao [1 ]
Bao, Meng-Tian [1 ]
机构
[1] Hangzhou Dianzi Univ, Key Lab RF Circuits & Syst, Minist Educ, Hangzhou 310018, Peoples R China
[2] Yangzhou Marine Elect Instrument Inst, Yangzhou 225001, Peoples R China
基金
中国国家自然科学基金;
关键词
Single-event burnout (SEB); Silicon carbide (SiC); Schottky diode; BARRIER DIODES; THERMAL-DAMAGE; SIMULATION; MOSFETS; PLANAR; SEB;
D O I
10.1016/j.microrel.2022.114865
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, a single-event burnout (SEB) hardening technique for Schottky diodes at a linear energy transfer (LET) value of 0.5 pC/mu m (75.5 MeV/mg/cm2) is presented and investigated by 2-D numerical simulations. The simulation results show that, when compared with the conventional junction barrier Schottky (JBS) diode with multiple buffer layers, the proposed structure can significantly reduce the electric field at the metal/SiC interface with the help of the trench, thereby reducing the interface temperature. Moreover, the maximum global tem-perature of the proposed structure is also reduced. The maximum global temperature of the proposed structure is 1989 K and the temperature at the Schottky contact interface is 439 K for the bias voltage of 1000 V and LET value of 0.5 pC/mu m (75.5 MeV/mg/cm2) which shows that the new structure has better SEB performance. In addition, the hardening method proposed in this paper can be applied at different breakdown voltages by adjusting the structural parameters of the device.
引用
收藏
页数:11
相关论文
共 36 条
[1]   Analysis of Heavy Ion Irradiation Induced Thermal Damage in SiC Schottky Diodes [J].
Abbate, C. ;
Busatto, G. ;
Cova, P. ;
Delmonte, N. ;
Giuliani, F. ;
Iannuzzo, F. ;
Sanseverino, A. ;
Velardi, F. .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2015, 62 (01) :202-209
[2]   Thermal damage in SiC Schottky diodes induced by SE heavy ions [J].
Abbate, C. ;
Busatto, G. ;
Cova, P. ;
Delmonte, N. ;
Giuliani, F. ;
Iannuzzo, F. ;
Sanseverino, A. ;
Velardi, F. .
MICROELECTRONICS RELIABILITY, 2014, 54 (9-10) :2200-2206
[3]  
[Anonymous], 2015, ATLAS US MAN DEV SIM
[4]   Ion-Induced Energy Pulse Mechanism for Single-Event Burnout in High-Voltage SiC Power MOSFETs and Junction Barrier Schottky Diodes [J].
Ball, D. R. ;
Hutson, J. M. ;
Javanainen, A. ;
Lauenstein, J. -M. ;
Galloway, K. F. ;
Johnson, R. A. ;
Alles, M. L. ;
Sternberg, A. L. ;
Sierawski, B. D. ;
Witulski, A. F. ;
Reed, R. A. ;
Schrimpf, R. D. .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2020, 67 (01) :22-28
[5]   COMPARISON OF 6H-SIC, 3C-SIC, AND SI FOR POWER DEVICES [J].
BHATNAGAR, M ;
BALIGA, BJ .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1993, 40 (03) :645-655
[6]   Single-Event Burnout Hardening Method and Evaluation in SiC Power MOSFET Devices [J].
Bi, Jian-Xiong ;
Wang, Ying ;
Wu, Xue ;
Li, Xing-ji ;
Yang, Jian-qun ;
Bao, Meng-Tian ;
Cao, Fei .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2020, 67 (10) :4340-4345
[7]   Ensure an original and safe "fail-to-open" mode in planar and trench power SiC MOSFET devices in extreme short-circuit operation [J].
Boige, F. ;
Richardeau, F. ;
Lefebvre, S. ;
Blaquiere, J. -M. ;
Guibaud, G. ;
Bourennane, A. .
MICROELECTRONICS RELIABILITY, 2018, 88-90 :598-603
[8]   EVIDENCE OF THE IONS IMPACT POSITION EFFECT ON SEB IN N-CHANNEL POWER MOSFETS [J].
DACHS, C ;
ROUBAUD, F ;
PALAU, JM ;
BRUGUIER, G ;
GASIOT, J ;
TASTET, P .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1994, 41 (06) :2167-2171
[9]   Silicon carbide benefits and advantages for power electronics circuits and systems [J].
Elasser, A ;
Chow, TP .
PROCEEDINGS OF THE IEEE, 2002, 90 (06) :969-986
[10]  
FFSP05120A, FFSP05120A DATASHEET