Total reflection PIXE (TPIXE) and RBS for surface and trace element analysis

被引：9

作者：

vanKan, JA

Vis, RD

机构：

[1] Faculty of Physics and Astronomy, Vrije Universiteit, 1081 HV Amsterdam

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1996年 / 109卷

关键词：

D O I：

10.1016/0168-583X(95)00890-X

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

MeV proton and alpha beams at small incident angles (0-35 mrad) were used to analyse flat surfaces such as Si wafers and coated quartz substrates. X-rays and backscattered particles were detected in a total reflection geometry. Using TPIXE a quick and simultaneous detection of different trace elements was established. At very small incident angles of a few mrad, it was observed that the RES yield drops faster than the X-ray yield, which indicates surface channelling.

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页码：85 / 93

页数：9

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