Structure and surface composition of NiCr sputtered thin films

被引：24

作者：

Petrovic, S. ^{[1
]}

Bundaleski, N. ^{[1
]}

Radovic, M. ^{[1
]}

Ristic, Z. ^{[1
]}

Gligoric, G. ^{[1
]}

Perusko, D. ^{[1
]}

Zec, S. ^{[1
]}

机构：

[1] Inst Nucl Sci Vinca, Belgrade 11001, Serbia

来源：

SCIENCE OF SINTERING | 2006年 / 38卷 / 02期

关键词：

nichrome thin films; LEIS; XRD;

D O I：

10.2298/SOS0602155P

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Thin films of nichrome were deposited by d.c. sputtering of a target (80%Ni - 20%Cr w.t.) by Ar+ ions at a working pressure of 10(-1) Pa and at room temperature. The phase composition and grain size were studied by X-ray Diffraction (XRD), while the surface chemical composition was determined by Low Energy Ion Scattering (LEIS). Analysis of phase composition showed that the NiCr thin films were a solid solution of chromium in a nickel matrix with increased nickel lattice parameters. LEIS analysis showed the presence of Ni, Cr and O in the first atomic layer. There is a strong suspicion that surface passivation occurred by forming Cr2O3 oxide at the surface.

引用

页码：155 / 160

页数：6

共 10 条

[1]

BUNDALESKI N, 2003, THESIS BELGRADE U

[2]

BUNDALESKI N, 2002, P 21 SPIG SOK YUG, V29, P218

[3] Oxidation study of a polycrystalline Ni/Cr alloy .4. 400 degrees C anneal in air [J].