Dynamic scaling in growth of platinum films on Si(100)

被引：26

作者：

Dharmadhikari, CV ^{[1
]}

Ali, AO

Suresh, N

Phase, DM

Chaudhari, SM

Ganesan, V

Gupta, A

Dasannacharya, BA

机构：

[1] Univ Poona, Dept Phys, Ctr Adv Studies Mat Sci & Solid State Phys, Poona 411007, Maharashtra, India

[2] Inter Univ Consortium DAE Facil, Indore 452017, India

来源：

SOLID STATE COMMUNICATIONS | 2000年 / 114卷 / 07期

关键词：

thin films; scanning tunneling microscopy; X-ray scattering;

D O I：

10.1016/S0038-1098(00)00069-7

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

The roughness and general morphology of platinum films grown on Si(100) substrates have been investigated using X-ray Scattering, Scanning Tunneling Microscopy and Atomic Force Microscopy. The results are quantitatively analyzed in terms of height histograms and height-height correlations in the light of dynamical scaling approach. The values of roughness exponent alpha congruent to 0.7, growth exponent beta congruent to 0.52 and dynamical scaling exponent z congruent to 1.4 are in agreement with improvised KPZ exponents based on Kolmogorov's energy cascade concept. (C) 2000 Elsevier Science Ltd. All rights reserved.

引用

页码：377 / 381

页数：5

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