Development of high repetition rate molecular fluorine lasers for metrology and inspection

被引：0

作者：

Huber, H ^{[1
]}

Bauer, M ^{[1
]}

Görtler, A ^{[1
]}

Strowitzki, C ^{[1
]}

Hohla, A ^{[1
]}

机构：

[1] TuiLaser AG, D-82110 Munich, Germany

来源：

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVIII, PTS 1 AND 2 | 2004年 / 5375卷

关键词：

UV source; excimer laser; fluorine laser; VUV; 157; nm; F-2; laser; inspection; metrology;

D O I：

10.1117/12.534062

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A new generation of compact Fluorine lasers has been developed for repetition rates up to 2 kHz. The output powers are in the range of 3 W at 157 nm. Due to the introduction of new concepts for the laser tube and the pulsed power module it was possible to increase the maximum repetition rate from 1 kHz to 2 kHz without any loss in the performance of the laser output parameters. The pulse-to-pulse stability of the laser energy is improved in comparison to previous laser generations. The results of long term tests and measurements of the laser output characteristic will be reported in detail. The state-of-the-art of compact excimer lasers will be presented and an outlook for future trends will be given.

引用

页码：792 / 797

页数：6

共 6 条

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[2] GOERTLER A, 2003, 4 INT S 157 NM LITH
[3] GOERTLER A, 2003, P 2 INT WLT C LAS MA, P419
[4] GOERTLER A, 2001, P SPIE, V4184
[5] High repetition rate compact excimer laser:: UV light source for metrology, inspection, direct writing and material testing
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Pflanz, T
Görtler, A
Schillinger, H
[J]. EMERGING LITHOGRAPHIC TECHNOLOGIES VII, PTS 1 AND 2, 2003, 5037 : 1092 - 1099
[6] FAST-DISCHARGE-INITIATED KRF LASER
SUTTON, DG
SUCHARD, SN
GIBB, OL
WANG, CP
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