Improvement of field emission characteristics of tungsten oxide nanowires by hydrogen plasma treatment

被引：14
|
作者：
Tsai, W. -C. [1 ]
Wang, S. -J. [1 ]
Chang, C. -L. [1 ]
Chen, C. -H. [2 ]
Ko, R. -M. [1 ]
Liou, B. -W. [3 ]
机构：
[1] Natl Cheng Kung Univ, Dept Elect Engn, Inst Microelect, Tainan 70101, Taiwan
[2] Taiwan Semicond Mfg Co Ltd TSMC, Hsinchu 300, Taiwan
[3] Wu Feng Inst Technol, Dept Elect Engn, Chiayi 62153, Taiwan
来源：
EPL | 2008年 / 84卷 / 01期
关键词：
D O I：
10.1209/0295-5075/84/16001
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
The use of hydrogen plasma (H-plasma) treatment to improve field emission (FE) characteristics of self-synthesized tungsten oxide nanowires (TONWs) is reported. With a H-plasma treatment under a working power of 200 W and a pressure of 500 mtorr for 20 s, improved FE characteristics with a turn-on field (4.7 V/mu m at 10 mu A/cm(2)) lower than those of the as-grown case by 23% and a reduction in the effective emission barrier of 0.72 eV were obtained, which is attributed to the reduction in oxygen adsorption, decrease in the wire length and density, and transition of TONWs surfaces from well crystalline into the amorphous phase. Copyright (C) EPLA, 2008
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页数：5
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