Athermalized polymeric arrayed-waveguide grating by partial detachment from a Si substrate

被引：12
作者：
Lee, JM [1 ]
Ahn, JT [1 ]
Park, S [1 ]
Lee, MH [1 ]
机构：
[1] ETRI, Basic Res Lab, Taejon, South Korea
来源：
ETRI JOURNAL | 2004年 / 26卷 / 03期
关键词：
waveguide; polymer; AWG;
D O I：
10.4218/etrij.04.0203.0027
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We demonstrate a new fabrication method for adjusting the temperature dependence of a polymeric arrayed waveguide grating (AWG) on a Si substrate. A temperature-dependent wavelength shift of -0.1 nm/degreesC in a polymeric AWG on a Si substrate is reduced to +0.01 nm/degreesC by detachingpart of the polymer film, including the grating channel region of the AWG, from the Si substrate while the other parts remain fixed on the substrate.
引用
收藏
页码：281 / 284
页数：4
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