Spin- and energy relaxation of hot electrons at GaAs surfaces

被引:0
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作者
Ohms, Torsten [1 ]
Hiebbner, Kevin [1 ]
Schneider, Hans Christian [1 ]
Aeschlimann, Martin [1 ]
机构
[1] Kaiserlautern Univ Technol, Dept Phys, D-67663 Kaiserslautern, Germany
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O59 [应用物理学];
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摘要
The mechanisms for spin relaxation in semiconductors are reviewed, and the mechanism prevalent in p-doped semiconductors, namely spin relaxation due to the electron-hole exchange interaction, or Bir-Aronov-Pikus mechanism, is presented in some depth. It is shown that the solution of Boltzmann-type kinetic equations allows one to obtain quantitative results for spin relaxation in semiconductors that go beyond the original Bir-Aronov-Pikus relaxation-rate approximation. Experimental results using surface-sensitive two-photon photoemission techniques show that the relaxation time of the electron spin polarization in p-doped GaAs at a semiconductor/metal surface is several times longer than the corresponding bulk spin-relaxation times. A theoretical explanation of these results in terms of the reduced density of holes in the band-bending region at the surface is presented.
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页码:309 / 340
页数:32
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