Effects of process parameters on the optical constants of highly textured V2O5 thin films

被引：7

作者：

Atuchin, V. V. ^{[1
,2
,3
]}

Kochubey, V. A. ^{[1
]}

Pokrovsky, L. D. ^{[1
]}

Kruchinin, V. N. ^{[4
]}

Ramana, C. V. ^{[5
]}

机构：

[1] Russian Acad Sci, Inst Semicond Phys, Siberian Branch, Lab Opt Mat & Struct, Novosibirsk 630090, Russia

[2] Tomsk State Univ, Funct Elect Lab, Tomsk 634050, Russia

[3] Novosibirsk State Univ, Lab Semicond & Dielect Mat, Novosibirsk 630090, Russia

[4] Russian Acad Sci, Inst Semicond Phys, Lab Ellipsometry Semicond Mat & Struct, Novosibirsk 630090, Russia

[5] Univ Texas El Paso, Dept Mech Engn, El Paso, TX 79968 USA

来源：

OPTICS AND SPECTROSCOPY | 2014年 / 117卷 / 03期

关键词：

PULSED-LASER DEPOSITION; VANADIUM PENTOXIDE; LI INTERCALATION; MICROSTRUCTURE; ELLIPSOMETRY; GROWTH;

D O I：

10.1134/S0030400X14090033

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The optical properties of the highly-textured V2O5 thin-films grown on Si(100) by sputter-deposition at various oxygen reactive-pressures were investigated in detail. The profiles of the optical constants, namely the refractive index and extinction coefficient, of V2O5 films were evaluated in the photon-energy range of 1-5 eV. At photon-energy above 2.5 eV, the dispersion behavior in optical constants is explained based on Lorentz-Drude model. The refractive index dispersion fits to a Cauchy's relation at photon-energy below 2.5 eV, where the V2O5-film is mostly transparent. The optical transitions across the bandgap occur at energy similar to 2.5-3.2 eV depending on the V2O5 growth conditions and film-microstructure. The highly-textured and c-axis oriented V2O5-films, fabricated under optimum conditions of temperature and oxygen partial pressure, exhibit excellent optical characteristics similar to V2O5 single crystals.

引用

页码：423 / 427

页数：5

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