A General Harmonic Rule Controller for Run-to-Run Process Control

被引:16
|
作者
He, Fangyi [1 ]
Wang, Kaibo [2 ]
Jiang, Wei [3 ]
机构
[1] Stevens Inst Technol, Sch Syst & Enterprises, Hoboken, NJ 07030 USA
[2] Tsinghua Univ, Dept Ind Engn, Beijing 100084, Peoples R China
[3] Hong Kong Univ Sci & Technol, Dept Ind Engn & Logist Management, Kowloon, Hong Kong, Peoples R China
基金
中国国家自然科学基金;
关键词
Automatic process control; EWMA; robust control; worst case; STATISTICAL PROCESS-CONTROL; COMBINING SPC; ADJUSTMENT; PERFORMANCE;
D O I
10.1109/TSM.2009.2017627
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The existence of initial bias in parameter estimation is an important issue in controlling short-run processes in semiconductor manufacturing. Harmonic rule has been widely used in machine setup adjustment problems. This paper generalizes the harmonic rule to a new controller called general harmonic rule (GHR) controller in run-to-run process control. The stability and optimality of the GHR controller is discussed for a wide range of stochastic disturbances. A numerical study is performed to compare the sensitivity of the GHR controller, the exponentially weighted moving average (EWMA) controller and the variable EWMA controller. It is shown that the GHR controller is more robust than the EWMA controller when the process parameters are estimated with uncertainty.
引用
收藏
页码:232 / 244
页数:13
相关论文
共 50 条
  • [1] Run-To-Run control of the Czochralski process
    Rahnianpour, Parsa
    Saelid, Steinar
    Hovd, Morten
    COMPUTERS & CHEMICAL ENGINEERING, 2017, 104 : 353 - 365
  • [2] Application of a Run-to-Run Controller to a Vapor Phase Epitaxy Process
    De Luca, C.
    Maran, E.
    Baumgartl, J.
    Beghi, A.
    2009 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE, 2009, : 211 - 216
  • [3] Run-to-run process control with qualitative information
    Wang, KB
    Tsung, FG
    Proceedings of the 4th International Conference on Quality & Reliability, 2005, : 253 - 259
  • [4] Adaptive Cautious Regularized Run-to-Run Controller for Lithography Process
    Zhong, Zhen
    Wang, Andi
    Kim, Hyunsik
    Paynabar, Kamran
    Shi, Jianjun
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2021, 34 (03) : 387 - 397
  • [5] Stability conditions and robustness analysis of a general MMSE run-to-run controller
    Tseng, Sheng-Tsaing
    Tsung, Fugee
    Wu, Jo-Hua
    IISE TRANSACTIONS, 2019, 51 (11) : 1279 - 1287
  • [6] Factory-wide run-to-run process control
    Yelverton, M
    Tsakalis, K
    Stoddard, K
    SOLID STATE TECHNOLOGY, 1999, 42 (12) : 45 - +
  • [7] Run-to-run process control: Literature review and extensions
    DelCastillo, E
    Hurwitz, AM
    JOURNAL OF QUALITY TECHNOLOGY, 1997, 29 (02) : 184 - 196
  • [8] CMP process run-to-run control to adjust margin in control limit
    Morisawa, Toshihiro
    Abe, Hisahiko
    Tachikawa, Kousaku
    Nakajima, Toshihiro
    PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 2011, 35 (01): : 65 - 72
  • [9] A new run-to-run control method for oxide CMP process
    Wang, J
    He, QP
    DATA ANALYSIS AND MODELING FOR PROCESS CONTROL II, 2005, 5755 : 9 - 17
  • [10] A RLS Run-to-Run Control Approach for Semiconductor Manufacturing Process
    Liu, Shujie
    Zheng, Ying
    Luo, Ming
    Wang, Yanwei
    PROCEEDINGS OF THE 10TH WORLD CONGRESS ON INTELLIGENT CONTROL AND AUTOMATION (WCICA 2012), 2012, : 2642 - 2646