Formation of one-dimensional crystalline silica on a metal substrate

被引：15
|
作者：
Lu, J. -L.
Kaya, S.
Weissenrieder, J.
Todorova, T. K.
Sierka, M.
Sauer, J.
Gao, H. -J.
Shaikhutdinov, S.
Freund, H. -J.
机构：
[1] Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
[2] Humboldt Univ, Inst Chem, D-10099 Berlin, Germany
[3] Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China
来源：
SURFACE SCIENCE | 2006年 / 600卷 / 13期
关键词：
thin films; silica; epitaxy; scanning tunneling microscopy; density functional theory; vibrational spectroscopy;
D O I：
10.1016/j.susc.2006.04.039
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
We have observed formation of one-dimensional silica structures of 0.5 nm in width on Mo(112) single crystal surface. Combination of high-resolution scanning tunneling microscopy, photoelectron and infrared spectroscopy, and density functional theory provides strong evidence for formation of paired rows of corner sharing [SiO4] tetrahedra chemisorbed on a metal substrate. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码：L164 / L168
页数：5
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