Formation of one-dimensional crystalline silica on a metal substrate

被引:15
作者
Lu, J. -L.
Kaya, S.
Weissenrieder, J.
Todorova, T. K.
Sierka, M.
Sauer, J.
Gao, H. -J.
Shaikhutdinov, S.
Freund, H. -J.
机构
[1] Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
[2] Humboldt Univ, Inst Chem, D-10099 Berlin, Germany
[3] Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China
关键词
thin films; silica; epitaxy; scanning tunneling microscopy; density functional theory; vibrational spectroscopy;
D O I
10.1016/j.susc.2006.04.039
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have observed formation of one-dimensional silica structures of 0.5 nm in width on Mo(112) single crystal surface. Combination of high-resolution scanning tunneling microscopy, photoelectron and infrared spectroscopy, and density functional theory provides strong evidence for formation of paired rows of corner sharing [SiO4] tetrahedra chemisorbed on a metal substrate. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:L164 / L168
页数:5
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