Study of the spatial resolution of a new 3D microfabrication process: the microstereophotolithography using a dynamic mask-generator technique

被引:79
作者
Bertsch, A [1 ]
Yezequel, JY [1 ]
Andre, JC [1 ]
机构
[1] ECOLE NATL SUPER IND CHIM,INST NATL POLYTECH LORRAINE,GDR 1080,CNRS,F-54001 NANCY,FRANCE
关键词
LCD; microtechniques; rapid prototyping; acrylates; photopolymerization;
D O I
10.1016/S1010-6030(96)04585-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In order to manufacture new micromechanical components, a new 3D microfabrication technique called the 'microstereophotolithography using a dynamic mask-generator' process has been developed. This technique is based on the use of a liquid crystal display as dynamic mask-generator. It obliged us to choose photopolymerizable chemical mixtures, specifically designed for microfabrication, that react to visible wavelengths. The chemical resin we used showed a main disadvantage. It contains an organic dye that undergoes photochemical bleaching. A precise control of the spatial resolution of the physico-chemical processes happening during the photoreaction is required in order to manufacture small components. Then, the influence of photobleaching on the photopolymerization resolution has thus been investigated. An experimental study has been compared with a mathematical model describing the phenomenon and allowed to optimize the operating conditions of the microstereophotolithography device we built, and to manufacture small three-dimensional objects made of a large number of complex layers with a resolution better than 5 mu m. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:275 / 281
页数:7
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