Surface Recombination Limited Lifetimes of Photoexcited Carriers in Few-Layer Transition Metal Dichalcogenide MoS2

被引:184
作者
Wang, Haining [1 ]
Zhang, Changjian [1 ]
Rana, Farhan [1 ]
机构
[1] Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA
关键词
2D Materials; ultrafast dynamics; carrier recombination; quantum well; Auger scattering swface recombination; MONO LAYER; MONOLAYER; SILICON; PASSIVATION; DYNAMICS; ELECTRON; DEFECTS; DIODES;
D O I
10.1021/acs.nanolett.5b03708
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We present results on photoexcited carrier lifetimes in few-layer transition metal dichalcogenide MoS, using nondegenerate ultrafast optical pump-probe technique. Our results show a sharp increase of the carrier lifetimes with the number of layers in the sample. Carrier lifetimes increase from few tens of picoseconds in monolayer samples to more than a nanosecond in 10-layer samples. The inverse carrier lifetime was found to scale according to the probability of the carriers being present at the surface layers, as given by the carrier wave function in few layer samples, which can be treated as quantum wells. The carrier lifetimes were found to be largely independent of the temperature, and the inverse carrier lifetimes scaled linearly with the photo excited carrier density. These observations are consistent with defect-assisted carrier recombination, in which the capture of electrons and holes by defects occurs via Auger scatterings. Our results suggest that carrier lifetimes in few-layer samples are surface recombination limited due to the much larger defect densities at surface layers compared with the inner layers.
引用
收藏
页码:8204 / 8210
页数:7
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