Localized CO2 laser treatment for mitigation of 351 nm damage growth on fused silica

被引:62
作者
Brusasco, RM [1 ]
Penetrante, BM [1 ]
Butler, JA [1 ]
Hrubesh, LW [1 ]
机构
[1] Lawrence Livermore Natl Lab, Livermore, CA 94551 USA
来源
LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2001 PROCEEDINGS | 2002年 / 4679卷
关键词
laser damage; laser damage mitigation; CO2 laser mitigation; fused silica;
D O I
10.1117/12.461711
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A technique for inhibiting the growth of laser-induced surface damage on fused silica, initiated and propagated at the 351 nm laser wavelength, has been investigated. The technique exposes the damage sites to single pulses of a CO2 laser operating at the 10.6 mum wavelength at or near beam focus. This method results in a very localized treatment of the laser damage site and modifies the site such that laser damage does not propagate further. A laser damage site initiated with a single pulse of 355 run laser light at approximate to45 J cm(-2) and 7.5 ns pulse duration grows rapidly upon further illumination at 8 J cm(-2) with 100% probability. Treatment of these sites with single pulses of 10.6 mum laser light for one second at a power level of between 17 and 37 Watts with a beam diameter of 5 mm alters the damage site such that it does not grow with subsequent 351 nm laser illumination at 8 J cm(-2) 10 ns pulse duration for > 1000 shots. The technique has been found to be 100% effective at stopping,the growth of the laser damage.
引用
收藏
页码:40 / 47
页数:8
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