Thin-Film Processing Routes for Combinatorial Materials Investigations-A Review

被引:51
作者
McGinn, Paul J. [1 ]
机构
[1] Univ Notre Dame, Dept Chem & Biomol Engn, Notre Dame, IN 46556 USA
关键词
combinatorial discovery; combinatorial processing; high-throughput experimentation; thin-film processing; physical vapor deposition; chemical vapor deposition; CHEMICAL-VAPOR-DEPOSITION; PULSED-LASER DEPOSITION; HIGH-THROUGHPUT SYNTHESIS; GLANCING ANGLE DEPOSITION; BIAS-GRADED DEPOSITION; REACTOR FLUID-DYNAMICS; COMPOSITIONAL SPREADS; FUNCTIONAL PROPERTY; SUBSTRATE EPITAXY; PHASE;
D O I
10.1021/acscombsci.9b00032
中图分类号
O69 [应用化学];
学科分类号
081704 ;
摘要
High-throughput combinatorial investigations are transforming materials discovery, phase diagram development, and processing optimization. Thin-film deposition techniques are frequently used to fabricate sample libraries employed in these studies. Various adaptations of well-known thin-film chemical vapor deposition (CVD) and physical vapor deposition (PVD) techniques utilized for the synthesis of inorganic combinatorial thin-film materials libraries are reviewed, with novel processing approaches being highlighted. Methods for developing gradients in composition of other film properties are described. Issues and considerations specific to thin-film processing of combinatorial materials libraries are discussed, with some emphasis on catalytic applications.
引用
收藏
页码:501 / 515
页数:15
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