Evaluation of elasto-plastic properties of rro film using combined nanoindentation and finite element approach

被引：22

作者：

Gupta, Ankur Kumar ^{[1
]}

Porwal, Deeksha ^{[2
]}

Dey, Arjun ^{[1
]}

Sridhara, N. ^{[1
]}

Mukhopadhyay, Anoop Kumar ^{[3
]}

Sharma, Anand Kumar ^{[1
]}

Barshilia, Harish C. ^{[4
]}

机构：

[1] ISRO Satellite Ctr, Bangalore 560017, Karnataka, India

[2] Bundelkhand Inst Engn & Technol, Jhansi 284128, Uttar Pradesh, India

[3] CSIR Cent Glass & Ceram Res Inst, Adv Mech & Mat Characterizat Div, Kolkata 700032, India

[4] CSIR Natl Aerosp Labs, Surface Engn Div, Nanomat Res Lab, Bangalore 560017, Karnataka, India

来源：

CERAMICS INTERNATIONAL | 2016年 / 42卷 / 01期

关键词：

Indium tin oxide; Nanoindentation; Finite element model; Elasto-plastic properties; Stress-strain; INDIUM-TIN-OXIDE; ELASTIC-PLASTIC PROPERTIES; THIN-FILMS; MECHANICAL-PROPERTIES; FRACTURE-TOUGHNESS; CRITICAL RATIO; ITO FILMS; TRANSPARENT; SUBSTRATE; SIMULATION;

D O I：

10.1016/j.ceramint.2015.09.054

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Here we report for the first time the combined nanoindentation experiments and finite element modeling to investigate the in-depth nanomechanical behavior of similar to 1.25 mu m indium tin oxide (ITO) film. The ITO film is grown on silicon substrate by a reactive direct current (DC) magnetron sputtering technique. Here, the contributions of both film and substrate are considered in a power law based nonlinear material model. Based on experimental data a detailed study is carried out in the present work to investigate the stress strain behavior, the related von-Mises stress and equivalent plastic strain of the ITO film. In addition, the effect of the nanoindentation response of the ITO film on the silicon substrate is also evaluated. (C) 2015 Elsevier Ltd and Techna Group S.r.l. All rights reserved.

引用

页码：1225 / 1233

页数：9

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