Binderless fabrication of amorphous RuO2 electrode for electrochemical capacitor using spark plasma sintering technique
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作者:
Kuratani, K.
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Natl Inst Adv Ind Sci & Technol, Res Inst Ubiquitous Energy Devices, Osaka 5638577, JapanNatl Inst Adv Ind Sci & Technol, Res Inst Ubiquitous Energy Devices, Osaka 5638577, Japan
Kuratani, K.
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Tanaka, H.
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Natl Inst Adv Ind Sci & Technol, Res Inst Ubiquitous Energy Devices, Osaka 5638577, JapanNatl Inst Adv Ind Sci & Technol, Res Inst Ubiquitous Energy Devices, Osaka 5638577, Japan
Tanaka, H.
[1
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Takeuchi, T.
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Natl Inst Adv Ind Sci & Technol, Res Inst Ubiquitous Energy Devices, Osaka 5638577, JapanNatl Inst Adv Ind Sci & Technol, Res Inst Ubiquitous Energy Devices, Osaka 5638577, Japan
Takeuchi, T.
[1
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Takeichi, N.
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Natl Inst Adv Ind Sci & Technol, Res Inst Ubiquitous Energy Devices, Osaka 5638577, JapanNatl Inst Adv Ind Sci & Technol, Res Inst Ubiquitous Energy Devices, Osaka 5638577, Japan
Takeichi, N.
[1
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Kiyobayashi, T.
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Natl Inst Adv Ind Sci & Technol, Res Inst Ubiquitous Energy Devices, Osaka 5638577, JapanNatl Inst Adv Ind Sci & Technol, Res Inst Ubiquitous Energy Devices, Osaka 5638577, Japan
Kiyobayashi, T.
[1
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Kuriyama, N.
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Natl Inst Adv Ind Sci & Technol, Res Inst Ubiquitous Energy Devices, Osaka 5638577, JapanNatl Inst Adv Ind Sci & Technol, Res Inst Ubiquitous Energy Devices, Osaka 5638577, Japan
Kuriyama, N.
[1
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[1] Natl Inst Adv Ind Sci & Technol, Res Inst Ubiquitous Energy Devices, Osaka 5638577, Japan
The spark plasma sintering (SPS) technique was successfully used to mold a hydrous amorphous RuO2 electrode Without any additives and binders. At the cyclic voltammetry (CV) scan rate of 1 mVs(-1), the electrochemical capacitances of the RuO2 electrodes are 600-700 Fg(-1) for the entire electrode. An increase in the SPS current during the compaction led to the crystallization and dehydration of RuO2. which in turn, resulted in a significant decrease in its capacitance. There is room to improve the rate properties as we observed a steep drop in the capacitance when the CV scan rate was raised. (C) 2009 Elsevier B.V. All rights reserved.
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Shinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, JapanShinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, Japan
Iwata, H
Yokoshima, K
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Shinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, JapanShinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, Japan
Yokoshima, K
Murakami, Y
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Shinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, JapanShinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, Japan
Murakami, Y
Takasu, Y
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Shinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, JapanShinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, Japan
机构:
Shinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, JapanShinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, Japan
Iwata, H
Yokoshima, K
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Shinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, JapanShinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, Japan
Yokoshima, K
Murakami, Y
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Shinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, JapanShinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, Japan
Murakami, Y
Takasu, Y
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Shinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, JapanShinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, Japan